SCHEMBL1398384

SCHEMBL1398384

CC(C)(C)c1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=C(OCC(F)(F)S(=O)(=O)[O-])C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.38
GAA P10253 1/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
RECQL P46063 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
HSD11B1 P28845 1/20 0.35
CYP17A1 P05093 4/20 0.35
CYP19A1 P11511 4/20 0.35
KDM4E B2RXH2 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
LMNA P02545 1/20 0.34
HPGD P15428 1/20 0.32
P2RX4 Q99571 1/20 0.32
P2RX7 Q99572 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544306 0.92 ALDH1A1 (0.43) ALDH1A1GAAKMT2ARECQLSMN1; SMN2
SCHEMBL31676706 0.90 ALDH1A1 (0.39) ALDH1A1GAAKMT2AMEN1RECQL
SCHEMBL1398375 0.85 ALDH1A1 (0.37) ALDH1A1GAAKMT2AMEN1RECQL
SCHEMBL546659 0.81 MEN1 (0.37) ALDH1A1GAAKMT2AMEN1SMN1; SMN2
SCHEMBL501700 0.81 ALDH1A1 (0.36) ALDH1A1KMT2AMEN1RECQLSMN1; SMN2
SCHEMBL31206130 0.81 ALDH1A1 (0.40) ALDH1A1GAAKMT2ARECQLSMN1; SMN2
SCHEMBL3454419 0.81 GAA (0.43) ALDH1A1GAAKMT2ARECQLSMN1; SMN2
SCHEMBL1398386 0.80 ALDH1A1 (0.43) ALDH1A1GAAKMT2AMEN1RECQL
SCHEMBL961482 0.79 SCN9A (0.34) ALDH1A1KMT2AMEN1RECQLHSD11B1
SCHEMBL30029869 0.79 ALDH1A1 (0.34) ALDH1A1KMT2AMEN1RECQLSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2081084-B1 Positive resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2014-12-24 EP disclosed
EP-2081083-B1 Positive resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2011-09-21 EP disclosed
US-8021822-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-20 US disclosed
US-8017302-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-13 US disclosed
US-7993811-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-09 US disclosed
EP-2081085-B1 Positive resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2011-03-02 EP disclosed
US-20090186297-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-07-23 US disclosed
US-20090186298-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-07-23 US disclosed
US-20090186296-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-07-23 US disclosed
EP-2081083-A1 Positive resist compositions and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-07-22 EP disclosed
EP-2081084-A1 Positive resist compositions and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-07-22 EP disclosed
EP-2081085-A1 Positive resist compositions and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-07-22 EP disclosed