Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | GAA | P10253 | 3/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.35 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31676706 | 0.94 | ALDH1A1 (0.39) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL1398384 | 0.92 | ALDH1A1 (0.38) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL1398375 | 0.92 | ALDH1A1 (0.37) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL31206130 | 0.87 | ALDH1A1 (0.40) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL3454419 | 0.85 | GAA (0.43) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL1398390 | 0.84 | ALDH1A1 (0.42) | ALDH1A1GAARECQLKMT2ACYP17A1 | |
| SCHEMBL501662 | 0.83 | L3MBTL1 (0.34) | ALDH1A1GAARECQLKMT2APOLB | |
| SCHEMBL2887913 | 0.83 | ALDH1A1 (0.40) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL4358881 | 0.81 | ALDH1A1 (0.44) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 | |
| SCHEMBL515758 | 0.81 | ALDH1A1 (0.39) | ALDH1A1GAARECQLKMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2142585-A1 | BRANCHED POLYCARBONATE RESINS AND PROCESSES TO PREPARE THE SAME | Sabic Innovative Plastics IP B.V. (NL) | 2010-01-13 | — | — | EP | claimed |
| WO-2008051652-A1 | BRANCHED POLYCARBONATE RESINS AND PROCESSES TO PREPARE THE SAME | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2008-05-02 | — | — | WO | claimed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| EP-2081084-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-20130317250-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-28 | — | — | US | disclosed |
| US-8581009-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8349533-B2 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8318404-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081083-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081085-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| WO-2008136842-A1 | POLY( CARBONATE-CO-UREA) COPOLYMERS | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2008-11-13 | — | — | WO | disclosed |
| WO-2008136841-A1 | POLY(CARBONATE-CO-UREA) COPOLYMERS AND MELT TRANSESTERIFICATION METHOD OF PREPARING THESE COPOLYMERS | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2008-11-13 | — | — | WO | disclosed |
| US-20080275206-A1 | POLY(CARBONATE-CO-UREA) COPOLYMERS AND MELT TRANSESTERIFICATION METHOD OF PREPARING THESE COPOLYMERS | GENERAL ELECTRIC COMPANY (US) | 2008-11-06 | — | — | US | disclosed |
| US-20080275209-A1 | POLY(CARBONATE-CO-UREA) COPOLYMERS AND MELT TRANSESTERIFICATION METHOD OF PREPARING THESE COPOLYMERS | GENERAL ELECTRIC COMPANY (US) | 2008-11-06 | — | — | US | disclosed |
| WO-2008051652-A1 | BRANCHED POLYCARBONATE RESINS AND PROCESSES TO PREPARE THE SAME | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2008-05-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130317250-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | PFAS, DDAH1, STS | ALDH1A1 421/4885GAA 1658/4885RECQL 4395/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.