Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.33 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.33 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.33 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.33 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 2/20 | 0.33 |
| ▸ | TOP1 | P11387 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17784467 | 0.86 | EPHX2 (0.38) | EPHX2FAAHTAS1R3TAS1R1S1PR2 | |
| SCHEMBL17784466 | 0.86 | EPHX2 (0.38) | EPHX2FAAHTAS1R3TAS1R1S1PR2 | |
| SCHEMBL424324 | 0.85 | EPHX2 (0.43) | EPHX2FAAHS1PR2S1PR1S1PR3 | |
| SCHEMBL2210119 | 0.82 | CA12 (0.40) | EPHX2S1PR2S1PR1S1PR3TP53 | |
| SCHEMBL9777768 | 0.78 | EPHX2 (0.54) | EPHX2FAAHPPARA | |
| SCHEMBL17784473 | 0.78 | EPHX2 (0.54) | EPHX2FAAHPPARA | |
| SCHEMBL9777764 | 0.78 | EPHX2 (0.54) | EPHX2FAAHPPARA | |
| SCHEMBL29002116 | 0.78 | ALDH1A1 (0.43) | EPHX2S1PR2S1PR1S1PR3TP53 | |
| SCHEMBL27915805 | 0.74 | LMNA (0.50) | EPHX2FAAHS1PR2S1PR1S1PR3 | |
| SCHEMBL29714065 | 0.74 | CA2 (0.38) | S1PR2S1PR1S1PR3TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2081084-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-8021822-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-7993811-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-09 | — | — | US | disclosed |
| EP-2081085-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081085-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |