Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.55 |
| ▸ | CA12 | O43570 | 4/20 | 0.42 |
| ▸ | CA1 | P00915 | 4/20 | 0.42 |
| ▸ | CA9 | Q16790 | 3/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | ZDHHC20 | Q5W0Z9 | 2/20 | 0.39 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.39 |
| ▸ | MGLL | Q99685 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.37 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.37 |
| ▸ | MMP1 | P03956 | 1/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | MMP3 | P08254 | 1/20 | 0.37 |
| ▸ | MMP8 | P22894 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 3/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL133198 | 1.00 | CA14 (0.55) | CA14CA12CA1CA9CA2 | |
| SCHEMBL1962811 | 1.00 | CA14 (0.55) | CA14CA12CA1CA9CA2 | |
| SCHEMBL136485 | 1.00 | CA14 (0.55) | CA14CA12CA1CA9CA2 | |
| SCHEMBL14755630 | 0.98 | CA14 (0.54) | CA14CA12CA1CA9CA2 | |
| SCHEMBL26616523 | 0.96 | CA14 (0.53) | CA14CA12CA1CA9CA2 | |
| SCHEMBL18163279 | 0.96 | CA14 (0.53) | CA14CA12CA1CA9CA2 | |
| SCHEMBL8021973 | 0.94 | CA14 (0.54) | CA14CA12CA1CA9CA2 | |
| SCHEMBL18599054 | 0.94 | CA14 (0.54) | CA14CA12CA1CA9CA2 | |
| SCHEMBL13527824 | 0.93 | CA14 (0.54) | CA14CA12CA1CA9CA2 | |
| SCHEMBL15801151 | 0.93 | CA14 (0.54) | CA14CA12CA1CA9CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 635 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113419404-A | Photoresist composition | 北京科华微电子材料有限公司 | 2021-09-21 | — | — | CN | claimed |
| WO-2026100281-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100258-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100259-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100282-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, POLYMER, AND ONIUM SALT | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260133493-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND METHOD FOR PRODUCING THE POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-05 | — | — | US | disclosed |
| US-12517429-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | SRMS, RAD1, SLC11A2 | CA14 291/4885CA12 474/4885CA1 110/4885 |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | RAD1, RPA1, RAD51 | CA14 50/4885CA12 149/4885CA1 10/4885 |
| US-20260133493-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND METHOD FOR PRODUCING THE POLYMER, AND COMPOUND | RAD51, RAD1, MRE11 | CA14 515/4885CA12 1456/4885CA1 1145/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.