SCHEMBL14029035

SCHEMBL14029035

CCOC(=O)NC1=CC(=Nc2ccc(N(CC)CC)cc2C)C(C)=CC1=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 12/20 0.41
LMNA P02545 6/20 0.41
SMN1; SMN2 Q16637 5/20 0.41
KDM4E B2RXH2 3/20 0.41
HTT P42858 5/20 0.37
ALDH1A1 P00352 5/20 0.36
GFER P55789 4/20 0.36
MAPK1 P28482 3/20 0.36
NPSR1 Q6W5P4 3/20 0.36
HSD17B10 Q99714 3/20 0.36
ALOX15 P16050 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
CYP2C19 P33261 3/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C9 P11712 1/20 0.36
MAOB P27338 1/20 0.35
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13206444 0.89 MAPT (0.36) MAPTLMNASMN1; SMN2HTTALDH1A1
SCHEMBL92422 0.89 MAPT (0.36) MAPTLMNASMN1; SMN2HTTALDH1A1
SCHEMBL10056665 0.83 MAPT (0.39) MAPTLMNASMN1; SMN2KDM4EHTT
SCHEMBL14047384 0.82 MAPT (0.40) MAPTLMNASMN1; SMN2HTTALDH1A1
SCHEMBL10000296 0.80 MEN1 (0.33) MAPTLMNASMN1; SMN2MAPK1L3MBTL1
SCHEMBL11315137 0.80 MTNR1B (0.39) MAPTLMNASMN1; SMN2KDM4EHTT
SCHEMBL10000294 0.79 MAPT (0.33) MAPTLMNASMN1; SMN2KDM4EALDH1A1
SCHEMBL11308355 0.76 MAPT (0.36) MAPTLMNAALDH1A1MAPK1NPSR1
SCHEMBL14141418 0.76 MAPT (0.42) MAPTLMNASMN1; SMN2KDM4EHTT
SCHEMBL10046787 0.76 MAPT (0.38) MAPTLMNASMN1; SMN2KDM4EHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080254981-A1 HEAT-SENSITIVE TRANSFER IMAGE-FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-16 US disclosed