SCHEMBL14035684

SCHEMBL14035684

O=C(Oc1cccc2ccccc12)C(F)(F)OOS

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.48
ALDH1A1 P00352 3/20 0.48
GAA P10253 2/20 0.48
PGR P06401 1/20 0.48
PTGS1 P23219 1/20 0.48
MAPK1 P28482 1/20 0.48
KMT2A Q03164 3/20 0.47
MEN1 O00255 1/20 0.47
RAB9A P51151 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
KDM4E B2RXH2 2/20 0.43
HPGD P15428 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
MMP2 P08253 1/20 0.42
FABP3 P05413 6/20 0.41
FABP7 O15540 5/20 0.41
FABP5 Q01469 4/20 0.41
BCHE P06276 1/20 0.41
SLC6A3 Q01959 1/20 0.41
ALOX5 P09917 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035918 0.81 KDM4E (0.46) ALDH1A1KDM4EHPGDTDP1OGG1
SCHEMBL4082182 0.81 ALDH1A1 (0.56) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL12128703 0.78 ALDH1A1 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL14035904 0.76 EPHX1 (0.44) KMT2AMEN1HPGDTDP1
SCHEMBL24360783 0.76 ALDH1A1 (0.56) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL13842663 0.75 HSD17B10 (0.47) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL17522557 0.75 ALDH1A1 (0.50) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL2605926 0.75 HSD17B10 (0.49) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL14035685 0.75 KMT2A (0.47) HSD17B10ALDH1A1KMT2AMEN1L3MBTL1
SCHEMBL15114264 0.75 ALDH1A1 (0.49) HSD17B10ALDH1A1GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed