Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | HTR1B | P28222 | 6/20 | 0.44 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 6/20 | 0.42 |
| ▸ | BCL2 | P10415 | 3/20 | 0.42 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.42 |
| ▸ | BAD | Q92934 | 2/20 | 0.42 |
| ▸ | ALB | P02768 | 1/20 | 0.42 |
| ▸ | HTR1D | P28221 | 2/20 | 0.42 |
| ▸ | OGG1 | O15527 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | HRH1 | P35367 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14035720 | 0.86 | IDO1 (0.40) | KDM4EALDH1A1HPGD | |
| SCHEMBL14035915 | 0.84 | TRPV1 (0.42) | KDM4EALDH1A1TDP1MCL1 | |
| SCHEMBL12128704 | 0.82 | KDM4E (0.53) | KDM4EALDH1A1HPGDTDP1HTR1B | |
| SCHEMBL14035684 | 0.81 | HSD17B10 (0.48) | KDM4EALDH1A1HPGDTDP1OGG1 | |
| SCHEMBL13842647 | 0.79 | KDM4E (0.45) | KDM4EALDH1A1HPGDTDP1HTR1B | |
| SCHEMBL2605920 | 0.79 | KDM4E (0.47) | KDM4EALDH1A1HPGDTDP1HTR1B | |
| SCHEMBL14035923 | 0.79 | PPARG (0.48) | KDM4EALDH1A1HPGDTDP1MCL1 | |
| SCHEMBL14035904 | 0.78 | EPHX1 (0.44) | HPGDTDP1ATM | |
| SCHEMBL14009409 | 0.78 | ALDH1A1 (0.46) | KDM4EALDH1A1HPGDTDP1HTR1B | |
| SCHEMBL13842639 | 0.77 | MCL1 (0.45) | KDM4EALDH1A1HPGDTDP1HTR1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274426-A1 | Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-11-06 | — | — | US | disclosed |