SCHEMBL1405779

SCHEMBL1405779

C=CC(=O)OCCC(OC(=O)C=C)C(C)O

nearest known ligand 0.47

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.47
HPGD P15428 1/20 0.46
ALDH1A1 P00352 4/20 0.46
TP53 P04637 3/20 0.46
HIF1A Q16665 3/20 0.46
CYP3A4 P08684 2/20 0.46
HSD17B10 Q99714 1/20 0.46
THRB P10828 2/20 0.39
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 2/20 0.35
ALOX15 P16050 1/20 0.33
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1592260 0.86 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
Phthalic Acid SCHEMBL28284049 0.85 THRB (0.45) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL20820751 0.83 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL23174693 0.82 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9720362 0.82 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28106733 0.82 TSHR (0.60) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL262349 0.80 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28449331 0.80 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL142522 0.80 TSHR (0.55) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27800524 0.80 TSHR (0.55) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120121858-A1 HYDROPHOBIC FILM, PATTERNED FILM HAVING HYDROPHOBIC AND HYDROPHILIC REGIONS, AND METHOD FOR PRODUCING THE SAME Kawamura Institue of Chemical Research (JP) 2012-05-17 US disclosed
EP-1610177-B1 PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM JSR CORP (JP) 2011-03-09 EP disclosed
US-7220334-B2 Method of manufacturing microdevice having laminated structure KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2007-05-22 US disclosed
US-7214471-B2 Photosensitive resin film and cured film made therefrom JSR CORPORATION (JP) 2007-05-08 US disclosed
US-20060210912-A1 Alkali-soluble copolymer of p-isopropenylphenol, unsaturated carboxy acid, acrylic ester, and unsaturated aliphatic polycyclic compound, especially isobornyl (meth)acrylate and tricyclo[5.2.1.02,6]decanyl (meth)acrylate; unsaturated compound; and radical polymerization initiator; used for forming bumps JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1610177-A1 PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM JSR Corporation (JP) 2005-12-28 EP disclosed
US-20030175162-A1 Microdevice having multilayer structure and method for fabricating the same KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2003-09-18 US disclosed
EP-1295846-A1 MICRODEVICE HAVING MULTILAYER STRUCTURE AND METHOD FOR FABRICATING THE SAME KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2003-03-26 EP disclosed