⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1406014 | 1.00 | — | — | |
| SCHEMBL31351402 | 0.86 | LPAR3 (0.40) | — | |
| SCHEMBL28464257 | 0.84 | FAAH (0.45) | — | |
| SCHEMBL388165 | 0.84 | — | — | |
| SCHEMBL388164 | 0.84 | — | — | |
| SCHEMBL28668663 | 0.82 | FAAH (0.48) | — | |
| SCHEMBL23668464 | 0.80 | — | — | |
| SCHEMBL31351387 | 0.80 | LMNA (0.36) | — | |
| SCHEMBL17918207 | 0.80 | — | — | |
| SCHEMBL31351414 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025023143-A1 | GLASS CLOTH TREATMENT LIQUID AND SURFACE TREATED GLASS CLOTH | 信越化学工業株式会社 | 2025-01-30 | — | — | WO | disclosed |
| EP-1696000-B2 | POLYESTER RESIN COMPOSITION AND MOLDED OBJECT | KANEKA CORP (JP) | 2014-10-15 | — | — | EP | disclosed |
| US-20110189476-A1 | ORGANIZED CLAY COMPOSITE, METHOD FOR PRODUCING THE SAME, AND RESIN COMPOSITE CONTAINING ORGANIZED CLAY COMPOSITE | SHOWA DENKO K.K. (JP) | 2011-08-04 | — | — | US | disclosed |
| EP-1696000-B1 | POLYESTER RESIN COMPOSITION AND MOLDED OBJECT | KANEKA CORP (JP) | 2011-03-09 | — | — | EP | disclosed |
| US-20100190908-A1 | ORGANIZED CLAY, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITE CONTAINING ORGANIZED CLAY | SHOWA DENKO K.K. (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2186776-A1 | ORGANIZED CLAY COMPLEX, METHOD FOR PRODUCING THE SAME, AND RESIN COMPLEX CONTAINING ORGANIZED CLAY COMPLEX | Showa Denko K.K. (JP) | 2010-05-19 | — | — | EP | disclosed |
| CN-101711224-A | Organized clay, process for producing the same, and resin composite containing organized clay | SHOWA DENKO KK | 2010-05-19 | — | — | CN | disclosed |
| EP-1420049-B1 | SURFACE-TREATED INORGANIC PARTICLES | KANEKA CORP (JP) | 2010-04-21 | — | — | EP | disclosed |
| EP-2172425-A1 | ORGANIZED CLAY, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITE CONTAINING ORGANIZED CLAY | Showa Dendo K.K. (JP) | 2010-04-07 | — | — | EP | disclosed |
| CN-101687655-A | Organized clay complex, method for producing the same, and resin complex containing organized clay complex | SHOWA DENKO KK | 2010-03-31 | — | — | CN | disclosed |
| US-20050214556-A1 | Organic-inorganic composite composition, plastic substrate, gas barrier laminate film, and image display device | FUJI PHOTO FILM CO., LTD (JP) | 2005-09-29 | — | — | US | disclosed |
| EP-0899308-B1 | THERMOPLASTIC RESIN COMPOSITION CONTAINING SILANE-TREATED FOLIATED PHYLLOSILICATE AND METHOD FOR PRODUCING THE SAME | KANEKA CORP (JP) | 2004-11-03 | — | — | EP | disclosed |
| US-20040197561-A1 | Process for producing surface-treated inorganic particle and surface-treated inogranic particle | KANEKA CORPORATION (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1026203-B1 | POLYESTER RESIN COMPOSITIONS AND PROCESSES FOR THE PREPARATION THEREOF | KANEKA CORP (JP) | 2004-09-08 | — | — | EP | disclosed |
| EP-1420049-A1 | PROCESS FOR PRODUCING SURFACE&minus;TREATED INORGANIC PARTICLE AND SURFACE&minus;TREATED INORGANIC PARTICLE | KANEKA CORPORATION (JP) | 2004-05-19 | — | — | EP | disclosed |
| US-6583208-B1 | Dispersion with organosilane-treated phyllosilicate | KANEKA CORPORATION (JP) | 2003-06-24 | — | — | US | disclosed |
| EP-1142954-A1 | RESIN COMPOSITIONS AND PROCESS FOR PRODUCING THE SAME | Kaneka Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6239195-B1 | INTRODUCING THE ORGANOSILANE COMPOUND INTO THE SWELLABLE LAYERED SILICATE AFTER THE BASAL SPACING OF THE SWELLABLE LAYERED SILICATE HAS BEEN EXPANDED, AND IS EXFOLIATED AS A NUMBER OF FINE LAYERS DISPERSED UNIFORMLY | KANEKA CORPORATION (JP) | 2001-05-29 | — | — | US | disclosed |
| EP-1026203-A1 | POLYESTER RESIN COMPOSITIONS AND PROCESSES FOR THE PREPARATION THEREOF | KANEKA CORPORATION (JP) | 2000-08-09 | — | — | EP | disclosed |
| EP-0899308-A1 | THERMOPLASTIC RESIN COMPOSITION CONTAINING CLAY COMPOSITE AND PROCESS FOR PREPARING THE SAME | KANEKA CORPORATION (JP) | 1999-03-03 | — | — | EP | disclosed |