SCHEMBL140760

SCHEMBL140760

C=CC(=O)Oc1ccc(O)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.56
ALDH5A1 P51649 1/20 0.50
ABAT P80404 1/20 0.50
ELANE P08246 3/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
GAA P10253 3/20 0.43
MAPT P10636 2/20 0.43
XBP1 P17861 1/20 0.43
KDM4E B2RXH2 1/20 0.42
GLA P06280 1/20 0.42
BLM P54132 1/20 0.42
CASP6 P55212 1/20 0.42
GFER P55789 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
PARP10 Q53GL7 1/20 0.41
P4HB P07237 1/20 0.39
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL824857 0.94 THRB (0.51) THRBALDH5A1ABATELANEMEN1
Methoxymethane SCHEMBL9576531 0.94 THRB (0.56) THRBALDH5A1ABATELANEMEN1
SCHEMBL2587522 0.91 THRB (0.64) THRBELANEMEN1KMT2AMAPT
SCHEMBL22472218 0.90 ALDH5A1 (0.52) THRBALDH5A1ABATELANEMEN1
SCHEMBL17244380 0.89 MAPT (0.51) THRBALDH5A1ABATELANEMEN1
Hydroquinone SCHEMBL28396105 0.89 CA2 (0.57) THRBALDH5A1ABATELANEKMT2A
SCHEMBL14370491 0.89 ALDH5A1 (0.50) THRBALDH5A1ABATELANEMEN1
SCHEMBL18608266 0.89 ALDH5A1 (0.50) THRBALDH5A1ABATELANEMEN1
SCHEMBL16429576 0.89 ALDH5A1 (0.50) THRBALDH5A1ABATELANEMEN1
SCHEMBL10015752 0.89 ALDH5A1 (0.50) THRBALDH5A1ABATELANEMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120059029-A Vinyl acetate copolymer and preparation method and application thereof 云南正邦科技有限公司 2025-05-30 CN claimed
CN-118585731-A Photodynamic sterilization computing system and method 中国农业大学 2024-09-03 CN claimed
CN-118542429-A Photodynamic sterilization inspection system and method 中国农业大学 2024-08-27 CN claimed
CN-117430802-B Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-05-10 CN claimed
CN-117801175-A Low-sensitivity ester polycarboxylate water reducer and preparation method and application thereof 科之杰新材料集团有限公司 2024-04-02 CN claimed
CN-117777375-A Ether polycarboxylate water reducer and preparation method and application thereof 科之杰新材料集团有限公司 2024-03-29 CN claimed
CN-117430802-A Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-01-23 CN claimed
CN-114544803-B HPLC analysis method for photoresist resin monomer acrylic ester compound 河北凯诺中星科技有限公司 2023-12-26 CN claimed
EP-4084784-A1 COMPOSITIONS AND METHODS Monash University (AU) 2022-11-09 EP claimed
CN-115251056-A Method for improving pollination rate by using bees as cold area facility bitter gourds 吉林省养蜂科学研究所(吉林省蜂产品质量管理监督站、吉林省蜜蜂遗传资源基因保护中心) 2022-11-01 CN claimed
EP-0177962-B1 PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1993-04-07 EP claimed
US-5175201-A VINYL-TERMINATED CARBAMYLMETHYLATED MELAMINES, VINYL-TERMINATED POLYURETHANE/POLYAMIDE POLYMERS AND COATING/ADHESIVE COMPOSITIONS CONTAINING SAME AMERICAN CYANAMID COMPANY (US) 1992-12-29 US claimed
EP-0184044-B1 LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-15 EP claimed
US-4939219-A Copolymer of phenolic ester of (meth)acrylic acid KANSAI PAINT COMPANY, LIMITED (JP) 1990-07-03 US claimed
EP-0327021-A2 Coating compositions for preventing adhesion of aquatic organisms KANSAI PAINT CO. LTD. (JP) 1989-08-09 EP claimed
US-4731316-A DIAZO RESIN, OLEOPHILIC, HIGH MOLECULAR WEIGHT ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1988-03-15 US claimed
US-4699867-A Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups HOECHST AKTIENGESELLSCHAFT (DE) 1987-10-13 US claimed
EP-0177962-A2 Photosensitive composition MITSUBISHI KASEI CORPORATION (JP) 1986-04-16 EP claimed
US-4032592-A G-METHACRYLOYLOXYPROPYL TRIMETHOXYSILANE MODIFIER UBE INDUSTRIES, LTD. (JA) 1977-06-28 US claimed
US-3970722-A Method for preparing a modified crystalline propylene polymer UBE INDUSTRIES, LTD. (JA) 1976-07-20 US claimed