SCHEMBL1408877

SCHEMBL1408877

C=Cc1cccc(S)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21881 0.81 TDP1 (0.67)
SCHEMBL30381592 0.78 TDP1 (0.64)
Ammonia Solution, Strong SCHEMBL31335086 0.78 TDP1 (0.64)
Water SCHEMBL20239051 0.78 TDP1 (0.64)
SCHEMBL21546206 0.78 CCNB2 (0.37)
Styrene SCHEMBL1778002 0.77 ALDH1A1 (0.74)
Hydrochloric Acid SCHEMBL29128956 0.76 TDP1 (0.61)
SCHEMBL28597294 0.75
SCHEMBL19672237 0.75
SCHEMBL29956149 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed
CN-104880908-B Photosensitive resin composition 住友化学株式会社 2019-12-13 CN disclosed
CN-109401177-A A kind of heat resistant and wear resistant styrenic elastomer 浙江汪洋高分子材料有限公司 2019-03-01 CN disclosed
US-9529117-B2 Polymerizable composition for optical material, method for producing same, and method for producing optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-12-27 US disclosed
EP-2816070-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-17 EP disclosed
EP-2816070-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2014-12-24 EP disclosed
US-20140357835-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-04 US disclosed
CN-102791747-B Gel polymer electrolyte composition KURARAY CO 2014-08-06 CN disclosed
EP-1560060-B1 Polarizing or photochromic plastic lens, coated sheet-like light element and method of its production MGC FILSEET CO LTD (JP) 2011-03-09 EP disclosed
US-7687664-B2 Carboxylic acid derivative, a salt thereof or an ester of them, and medicament comprising it EISAI R&D MANAGEMENT CO., LTD. (JP) 2010-03-30 US disclosed
CN-1209802-A Synthesis and use of retinoid having negative hormone and/or antagonist activity ALLERGAN CO (US) 1999-03-03 CN disclosed
US-5877207-A SKIN DISORDERS; ANTICARCINOGENIC AGENTS ALLERGAN SALES, INC. (US) 1999-03-02 US disclosed
WO-1998058922-A1 SYNTHESIS AND USE OF RETINOID COMPOUNDS HAVING NEGATIVE HORMONE AND/OR ANTAGONIST ACTIVITIES ALLERGAN SALES, INC. (US) 1998-12-30 WO disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed
EP-0853610-A2 SYNTHESIS AND USE OF RETINOID COMPOUNDS HAVING NEGATIVE HORMONE AND/OR ANTAGONIST ACTIVITIES Allergan (US) 1998-07-22 EP disclosed
US-5776699-A MEASURING GENE EXPRESSION ALLERGAN, INC. (US) 1998-07-07 US disclosed
WO-1997009297-A2 SYNTHESIS AND USE OF RETINOID COMPOUNDS HAVING NEGATIVE HORMONE AND/OR ANTAGONIST ACTIVITIES VISION PHARMACEUTICALS L.P. (US) 1997-03-13 WO disclosed
EP-0739967-A1 Fluorescent materials FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1996-10-30 EP disclosed
US-4725628-A Process of making a crosslinked superabsorbent polyurethane foam KIMBERLY-CLARK CORPORATION (US) 1988-02-16 US disclosed
US-4299911-A POLYMER CONTAINING AN ETHYLENICALLY UNSATURATED DOUBLE BOND SOMAR MANUFACTURING CO., LTD. (JP) 1981-11-10 US disclosed