SCHEMBL14093908

SCHEMBL14093908

CN(CCC(=O)Nc1cccc(-n2c(S)nnc2S)c1)N1CCCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.42
▸ ALDH1A1 P00352 4/20 0.42
▸ MEN1 O00255 2/20 0.42
▸ MAPT P10636 2/20 0.42
▸ KMT2A Q03164 2/20 0.42
▸ KDM4E B2RXH2 1/20 0.42
▸ USP2 O75604 1/20 0.42
▸ HPGD P15428 1/20 0.42
▸ BLM P54132 1/20 0.42
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ RAB9A P51151 2/20 0.39
▸ MAPK1 P28482 1/20 0.39
▸ KCNQ2 O43526 1/20 0.39
▸ TERT O14746 6/20 0.38
▸ CRHBP P24387 1/20 0.38
▸ CRHR2 Q13324 1/20 0.38
▸ CYP1A2 P05177 1/20 0.37
▸ CYP3A4 P08684 1/20 0.37
▸ CYP2C9 P11712 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683003 0.86 ALDH1A1 (0.48) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL14032705 0.85 RAB9A (0.43) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL14359778 0.78 TERT (0.46) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL14093902 0.77 TERT (0.42) POLBSMN1; SMN2TERT
SCHEMBL14557512 0.76 ALDH1A1 (0.49) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL14093873 0.76 TERT (0.40) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL13656906 0.74 POLB (0.42) POLBMEN1KMT2AKDM4EHDAC6
SCHEMBL14093923 0.73 ALDH1A1 (0.50) POLBALDH1A1MAPTSMN1; SMN2RAB9A
SCHEMBL14591267 0.73 MAPT (0.37) POLBALDH1A1MEN1MAPTKMT2A
SCHEMBL14394645 0.73 MAPT (0.37) POLBALDH1A1MEN1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 — — US disclosed
Send feedback