SCHEMBL1409756

SCHEMBL1409756

CC(C)(C)OC(=O)C1C2C=CC(C2)C1C(=O)OC(C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
POLB P06746 3/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HTT P42858 1/20 0.39
MAPK1 P28482 1/20 0.39
LMNA P02545 1/20 0.36
NFKB1 P19838 2/20 0.35
NFKB2 Q00653 2/20 0.35
RELA Q04206 2/20 0.35
CHRM2 P08172 1/20 0.34
CHRM1 P11229 1/20 0.34
CHRM3 P20309 1/20 0.34
KDM4E B2RXH2 1/20 0.33
APEX1 P27695 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
HRH3 Q9Y5N1 1/20 0.32
NR1H2 P55055 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5838089 0.93 ALDH1A1 (0.37) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL3150000 0.93 POLB (0.51) ALDH1A1POLBSMN1; SMN2LMNAKDM4E
SCHEMBL5837416 0.93 POLB (0.51) ALDH1A1POLBSMN1; SMN2LMNAKDM4E
SCHEMBL5838085 0.93 ALDH1A1 (0.37) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL686094 0.89 MAPK1 (0.38) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL18906481 0.88 MAPK1 (0.37) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL13898963 0.88 MAPK1 (0.37) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL7156320 0.87 ALDH1A1 (0.34) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL5838831 0.86 MAPK1 (0.33) ALDH1A1POLBSMN1; SMN2HTTMAPK1
SCHEMBL7723978 0.85 ALDH1A1 (0.37) ALDH1A1POLBSMN1; SMN2HTTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 378 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6403280-B1 TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY JSR CORPORATION (JP) 2002-06-11 US claimed
US-6391518-B1 COPOLYMER OF 5-NORBORNENE-2,3-DICARBOXYLIC ACID AND 5-NORBORNENE-2-CARBOXYLATE DERIVATIVES; SEMICONDUCTORS, PHOTOLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-05-21 US claimed
EP-1048983-A1 Radiation sensitive resin composition JSR Corporation (JP) 2000-11-02 EP claimed
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 EP disclosed
US-12552888-B2 Curable resin composition and display device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-02-17 US disclosed
US-12528983-B2 Curable resin composition and display device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-01-20 US disclosed
US-12504564-B2 Layered body and display device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-12-23 US disclosed
US-20250228063-A1 COMPOSITION, FILM, AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-07-10 US disclosed
US-20250215315-A1 COMPOSITION, FILM, AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-07-03 US disclosed
US-20250207026-A1 COMPOSITION, FILM, AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-06-26 US disclosed
CN-120195931-A Colored resin composition, color filter and display device 住友化学株式会社 2025-06-24 CN disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
US-6143466-A Chemically amplified photoresist composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2000-11-07 US disclosed
US-6143465-A Photosensitive polymer having cyclic backbone and resist composition comprising same SAMSUNG ELECTRONICS CO., LTD. (KR) 2000-11-07 US disclosed
EP-1048983-A1 Radiation sensitive resin composition JSR Corporation (JP) 2000-11-02 EP disclosed
EP-1034196-A1 CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS THE B.F. GOODRICH COMPANY (US) 2000-09-13 EP disclosed
WO-2000020472-A1 CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS THE B.F. GOODRICH COMPANY (US) 2000-04-13 WO disclosed
JP-2000063441-A PHOTOSENSITIVE POLYMER FOR CEHMICAL AMPLIFCATION-TYPE RESIST AND CEHMICAL AMPLIFICATION-TYPE RESIST COMPOSITION SAMSUNG ELECTRONICS CO LTD 2000-02-29 JP disclosed
EP-0930541-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-07-21 EP disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12552888-B2 Curable resin composition and display device RAD51, LPO, FTO ALDH1A1 1278/4885POLB 1138/4885SMN1; SMN2 989/4885
US-12528983-B2 Curable resin composition and display device TIPRL, NLRP1, RCSD1 ALDH1A1 899/4885POLB 4026/4885SMN1; SMN2 3079/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.