SCHEMBL1412754

SCHEMBL1412754

CC(C(=O)OCCC(CO)(CO)CO)=C(S)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23637 0.85 CHRM5 (0.32)
SCHEMBL10391730 0.83 CHRM5 (0.31)
SCHEMBL21527939 0.80
SCHEMBL1468169 0.80
SCHEMBL28437629 0.80 ALDH1A1 (0.37)
SCHEMBL1412656 0.78 TSHR (0.37)
SCHEMBL213774 0.77 THRB (0.50)
SCHEMBL3683181 0.76 ALDH1A1 (0.44)
SCHEMBL151938 0.76 ALDH1A1 (0.33)
SCHEMBL64443 0.74 TSHR (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9159356-B2 Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/reproducing method FUJIFILM CORPORATION (JP) 2015-10-13 US disclosed
US-20140078878-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL, NON-RESONANT POLYMER TWO-PHOTON ABSORPTION OPTICAL INFORMATION RECORDING MEDIUM, AND RECORDING/REPRODUCING METHOD FUJIFILM CORPORATION (JP) 2014-03-20 US disclosed
EP-2043096-B1 Two-photon absorption recording material containing dye having polymerizable group FUJIFILM CORP (JP) 2011-03-16 EP disclosed
US-20090088490-A1 TWO-PHOTON ABSORPTION RECORDING MATERIAL CONTAINING DYE HAVING POLYMERIZABLE GROUP FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
EP-2043096-A1 Two-photon absorption recording material containing dye having polymerizable group FUJIFILM Corporation (JP) 2009-04-01 EP disclosed
US-7112616-B2 Two-photon absorbing polymerizable composition and polymerization process thereof FUJI PHOTO FILM CO., LTD. (JP) 2006-09-26 US disclosed
US-20040204513-A1 Two-photon absorbing polymerizable composition and polymerization process thereof FUJI PHOTO FILM CO., LTD. 2004-10-14 US disclosed