Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.44 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.43 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.43 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.43 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | GALR3 | O60755 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1357295 | 0.80 | ALDH1A1 (0.37) | ALDH1A1SMN1; SMN2TP53CYP3A4MAPK1 | |
| SCHEMBL28437629 | 0.80 | ALDH1A1 (0.37) | ALDH1A1SMN1; SMN2TP53CYP3A4MAPK1 | |
| SCHEMBL23637 | 0.79 | CHRM5 (0.32) | ALDH1A1CHRM5CHRM1CHRM3SMN1; SMN2 | |
| SCHEMBL213774 | 0.79 | THRB (0.50) | ALDH1A1SMN1; SMN2TSHRTP53CYP3A4 | |
| SCHEMBL7708374 | 0.79 | MGAM (0.43) | ALDH1A1SMN1; SMN2GAATP53CYP3A4 | |
| SCHEMBL9115523 | 0.79 | ALDH1A1 (0.39) | ALDH1A1CHRM5CHRM1CHRM3SMN1; SMN2 | |
| SCHEMBL11791320 | 0.77 | ALDH1A1 (0.46) | ALDH1A1CHRM5CHRM1CHRM3SMN1; SMN2 | |
| SCHEMBL20956274 | 0.77 | NAAA (0.47) | ALDH1A1SMN1; SMN2GAATP53CYP3A4 | |
| SCHEMBL21809424 | 0.77 | PRKCA (0.41) | ALDH1A1SMN1; SMN2GAATP53CYP3A4 | |
| SCHEMBL6301944 | 0.77 | ALDH1A1 (0.41) | ALDH1A1CHRM5CHRM1CHRM3SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111892874-A | Double decomposition unsaturated polyol ester primer and preparation method thereof | 安徽江锐新材料有限公司 | 2020-11-06 | — | — | CN | claimed |
| US-7781506-B2 | Poly(vinyl alcohol) composition comprising a polyol | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-08-24 | — | — | US | claimed |
| US-20080182937-A1 | Poly(vinyl alcohol) composition comprising polyol | KURARAY CO., LTD. (JP) | 2008-07-31 | — | — | US | claimed |
| CN-114133090-B | Method and equipment for recycling propionic acid and butyric acid secondary mother liquor water | 江西吉煜新材料有限公司 | 2022-12-13 | — | — | CN | disclosed |
| CN-114133090-A | Method and equipment for recycling propionic acid and butyric acid secondary mother liquor water | 江西吉煜新材料有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-111892874-A | Double decomposition unsaturated polyol ester primer and preparation method thereof | 安徽江锐新材料有限公司 | 2020-11-06 | — | — | CN | disclosed |
| CN-105111077-B | A kind of method for reclaiming solvent in trimethylolpropane light component | 百川化工(如皋)有限公司 | 2017-03-29 | — | — | CN | disclosed |
| CN-104910750-A | Anticorrosive amino resin paint and preparation method thereof | SHANGHAI YOO PANT CHEMICAL INDUSTRY CO LTD | 2015-09-16 | — | — | CN | disclosed |
| US-20140123877-A1 | VOC FREE PRODUCT | BWE I MALMÖ AB (SE) | 2014-05-08 | — | — | US | disclosed |
| EP-2699633-A1 | VOC FREE PRODUCT | Bwe I Malmö Ab (SE) | 2014-02-26 | — | — | EP | disclosed |
| WO-2012144946-A1 | VOC FREE PRODUCT | BWE I MALMÖ AB (SE) | 2012-10-26 | — | — | WO | disclosed |
| US-5879837-A | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1999-03-09 | — | — | US | disclosed |
| US-5723633-A | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1998-03-03 | — | — | US | disclosed |
| US-5492942-A | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1996-02-20 | — | — | US | disclosed |
| EP-0627426-A1 | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1994-12-07 | — | — | EP | disclosed |
| EP-0624580-A1 | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1994-11-17 | — | — | EP | disclosed |
| US-4275174-A | METHYL METHACRYLATE-STYRENE COPOLYMER FORMED IN THE PRESENCE OF A POLYOL BORIC ACID ESTER | KYOWA GAS CHEMICAL INDUSTRY CO., LTD. (JP) | 1981-06-23 | — | — | US | disclosed |
| US-4138300-A | Process for producing a transparent shaped polymeric product | JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) | 1979-02-06 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4007152-A | PARTIALLY SAPONIFIED POLYVINYL ALCOHOL | TORAY INDUSTRIES, INC. (JA) | 1977-02-08 | — | — | US | disclosed |