Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.50 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.43 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | NAAA | Q02083 | 1/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.40 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | TOP2A | P11388 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12199291 | 0.87 | DGKA (0.50) | DGKAADRA2AADRA1AMAPTBLM | |
| SCHEMBL20210449 | 0.86 | DGKA (0.57) | DGKAADRA2AADRA1AMAPTDNM1 | |
| SCHEMBL447302 | 0.86 | DGKA (0.57) | DGKAMAPTDNM1ALDH1A1NAAA | |
| SCHEMBL20589 | 0.85 | DGKA (0.58) | DGKAADRA2AADRA1AMAPTBLM | |
| SCHEMBL20210623 | 0.85 | NAAA (0.61) | DGKADNM1NAAAHTR2C | |
| SCHEMBL5171884 | 0.85 | DGKA (0.61) | DGKAMAPTDNM1ALDH1A1NAAA | |
| SCHEMBL107227 | 0.83 | — | — | |
| SCHEMBL21618267 | 0.83 | DGKA (0.52) | DGKAADRA2AADRA1AMAPTBLM | |
| SCHEMBL20210455 | 0.83 | NAAA (0.64) | DGKADNM1NAAAHTR2C | |
| SCHEMBL20210612 | 0.83 | NAAA (0.64) | DGKADNM1NAAAHTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2081 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270481-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-08-28 | — | — | US | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| CN-117957488-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2024-04-30 | — | — | CN | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| WO-2023032753-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2023-03-09 | — | — | WO | claimed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | claimed |
| EP-0907108-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-01-28 | — | — | EP | claimed |
| US-6048659-A | PHOTOSENSITIVITY, ALKALINITY, QUINONEDIAZIDE AND MONOKETONE | JSR CORPORATION (JP) | 2000-04-11 | — | — | US | claimed |
| EP-0907108-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-04-07 | — | — | EP | claimed |
| CN-122095070-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122095069-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| US-12637529-B2 | Resin composition and display device using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-05-26 | — | — | US | disclosed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| EP-0816899-A2 | Color filter and black resist composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-01-07 | — | — | EP | disclosed |
| EP-0780731-A2 | Photopolymerizable composition for a color filter, color filter and liquid crystal display device | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0758097-A1 | POLYMERIZABLE COMPOSITION FOR COLOR FILTER | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-02-12 | — | — | EP | disclosed |
| US-4978754-A | REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1990-12-18 | — | — | US | disclosed |
| EP-0321256-A2 | Process of preparing unsaturated carboxylic acid amides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-06-21 | — | — | EP | disclosed |