⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1394205 | 0.96 | — | — | |
| SCHEMBL9776433 | 0.92 | LMNA (0.30) | — | |
| SCHEMBL23521465 | 0.90 | HTT (0.37) | — | |
| SCHEMBL139159 | 0.86 | ALDH1A1 (0.30) | — | |
| SCHEMBL612373 | 0.86 | — | — | |
| SCHEMBL612441 | 0.86 | — | — | |
| SCHEMBL23521512 | 0.84 | — | — | |
| SCHEMBL613799 | 0.83 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL614537 | 0.82 | ALDH1A1 (0.40) | — | |
| SCHEMBL1393421 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 307 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114456378-B | Polyimide for liquid crystal alignment agent and liquid crystal alignment film prepared from polyimide | 江苏三月科技股份有限公司 | 2024-02-27 | — | — | CN | claimed |
| CN-114456378-A | Polyimide for liquid crystal aligning agent and liquid crystal alignment film prepared from polyimide | 江苏三月科技股份有限公司 | 2022-05-10 | — | — | CN | claimed |
| US-9000086-B2 | Thermally curable resin composition for protective film | LG CHEM, LTD. (KR) | 2015-04-07 | — | — | US | claimed |
| US-20120010350-A1 | THERMALLY CURABLE RESIN COMPOSITION FOR PROTECTIVE FILM | LG CHEM, LTD. (KR) | 2012-01-12 | — | — | US | claimed |
| JP-4216819-A | — | — | None | — | — | JP | disclosed |
| US-12479943-B2 | Oil-extended modified conjugated diene-based polymer, method for preparing same and rubber composition comprising same | LG CHEM, LTD. (KR) | 2025-11-25 | — | — | US | disclosed |
| US-12460033-B2 | Modified conjugated diene-based polymer and rubber composition including the same | LG CHEM, LTD. (KR) | 2025-11-04 | — | — | US | disclosed |
| EP-4079806-B1 | OIL-EXTENDED MODIFIED CONJUGATED DIENE-BASED POLYMER, METHOD FOR PREPARING SAME, AND RUBBER COMPOSITION COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-09-24 | — | — | EP | disclosed |
| US-12359009-B2 | Modified conjugated diene-based polymer, method for preparing the same and rubber composition including the same | LG CHEM, LTD. (KR) | 2025-07-15 | — | — | US | disclosed |
| EP-3907244-B1 | MODIFIED CONJUGATED DIENE-BASED POLYMER, METHOD FOR PREPARING SAME, AND RUBBER COMPOSITION COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-07-09 | — | — | EP | disclosed |
| US-12344736-B2 | Modified conjugated diene-based polymer, method for preparing the same and rubber composition including the same | LG CHEM, LTD. (KR) | 2025-07-01 | — | — | US | disclosed |
| EP-3950746-B1 | MODIFIED CONJUGATED DIENE-BASED POLYMER AND RUBBER COMPOSITION INCLUDING THE SAME | LG CHEMICAL LTD (KR) | 2025-06-25 | — | — | EP | disclosed |
| EP-0466025-B1 | Resist material, method for the production of the same and process of forming resist patterns using the same | NIPPON TELEGRAPH & TELEPHONE (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0881523-A1 | LIQUID CRYSTAL DISPLAY ELEMENT SPACER AND LIQUID CRYSTAL DISPLAY ELEMENT | SEKISUI FINE CHEMICAL CO., LTD. (JP) | 1998-12-02 | — | — | EP | disclosed |
| US-5457003-A | Polysiloxane, polysilsesquioxane | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1995-10-10 | — | — | US | disclosed |
| US-5294835-A | Including the reaction product of a silane and a phenol aralkyl resin | NITTO DENKO CORPORATION (JP) | 1994-03-15 | — | — | US | disclosed |
| US-5153068-A | Discoloration inhibition | SEKISUI FINE CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| JP-H04216819-A | ONE-PACK EPOXY RESIN COMPOSITION | TOSHIBA CHEM CORP | 1992-08-06 | — | — | JP | disclosed |
| EP-0466025-A2 | Resist material, method for the production of the same and process of forming resist patterns using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-01-15 | — | — | EP | disclosed |
| US-5075459-A | Organosilicon compound | TOSHIBA SILICONE CO., LTD. (JP) | 1991-12-24 | — | — | US | disclosed |