SCHEMBL14216872

SCHEMBL14216872

Bc1cc(C(CC(C)(C)C)C(C)(C)C)ccc1O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 8/20 0.32
HSD17B10 Q99714 5/20 0.32
ALOX15 P16050 3/20 0.32
ALDH1A1 P00352 3/20 0.32
HPGD P15428 2/20 0.32
KDM4E B2RXH2 6/20 0.32
MAPK1 P28482 2/20 0.32
RECQL P46063 5/20 0.32
MAPT P10636 4/20 0.32
TSHR P16473 3/20 0.32
HIF1A Q16665 3/20 0.32
LMNA P02545 2/20 0.32
NFKB1 P19838 2/20 0.32
MTOR P42345 2/20 0.32
KMT2A Q03164 2/20 0.32
THPO P40225 1/20 0.32
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
BLM P54132 1/20 0.32
ADRB2 P07550 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22448293 0.84 TDP1 (0.46) TDP1HSD17B10ALOX15ALDH1A1HPGD
SCHEMBL12522902 0.81 ESR1 (0.44) TDP1
SCHEMBL19184383 0.80 SHBG (0.49) TDP1HSD17B10ALOX15ALDH1A1HPGD
SCHEMBL14111825 0.80 ALOX15 (0.40) TDP1HSD17B10ALOX15ALDH1A1HPGD
SCHEMBL14216835 0.78 TSHR (0.54) ALOX15ALDH1A1TSHRNFKB1BLM
SCHEMBL11960807 0.74 ESR1 (0.44) TDP1HSD17B10ALOX15ALDH1A1HPGD
SCHEMBL14646064 0.74
SCHEMBL784711 0.74 ESR1 (0.44) TDP1HSD17B10ALOX15ALDH1A1HPGD
SCHEMBL12018250 0.73 HSD17B10 (0.56) TDP1HSD17B10ALOX15TSHRHIF1A
SCHEMBL14220564 0.73 CA12 (0.50) HSD17B10MAPTTSHRLMNAADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1925979-A1 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition FUJIFILM Corporation (JP) 2008-05-28 EP disclosed
EP-1906241-A1 Resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed