SCHEMBL1426591

SCHEMBL1426591

CC1C(C=O)C1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4867806 0.79
SCHEMBL9268348 0.69
SCHEMBL10703026 0.68 APLNR (0.31)
SCHEMBL14255716 0.68 ALOX15 (0.31)
SCHEMBL9876676 0.67
SCHEMBL9317715 0.66
SCHEMBL8203450 0.66
SCHEMBL9876742 0.65
SCHEMBL14212245 0.65
SCHEMBL17431232 0.65 PTGS2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
WO-2020085508-A1 FILM-FORMING COMPOSITION 日産化学株式会社 2020-04-30 WO disclosed
EP-3524656-A1 NOVEL HYDROGELATOR National University Corporation Shizuoka University (JP) 2019-08-14 EP disclosed
US-20190241598-A1 NOVEL HYDROGELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2019-08-08 US disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-20180362454-A1 OIL GELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2018-12-20 US disclosed
EP-3381995-A1 OIL-GELLING AGENT National University Corporation Shizuoka University (JP) 2018-10-03 EP disclosed
US-9645494-B2 Resist underlayer film forming composition containing low molecular weight dissolution accelerator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-09 US disclosed
US-9543147-B2 Photoresist and method of manufacture TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2017-01-10 US disclosed
US-20160363863-A1 ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-15 US disclosed
EP-2154569-A1 PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS Nissan Chemical Industries, Ltd. (JP) 2010-02-17 EP disclosed
US-20090311624-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-12-17 US disclosed
CN-101558358-A Resist underlayer film forming composition containing low molecular weight dissolution promoter NISSAN CHEMICAL IND LTD (JP) 2009-10-14 CN disclosed
CN-101506736-A Resist underlayer film forming composition containing liquid additive NISSAN CHEMICAL IND LTD (JP) 2009-08-12 CN disclosed
EP-1463706-B1 PROCESS FOR PRODUCTION OF 3,3-DIMETHYL-2-FORMYLCYCLOPROPANECARBOXYLIC ACID DERIVATIVES SUMITOMO CHEMICAL CO (JP) 2008-02-27 EP disclosed
US-7304185-B2 Process for production of carbonyl compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-12-04 US disclosed
US-6153648-A Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2000-11-28 US disclosed
EP-1016649-A1 IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME Nissan Chemical Industries, Ltd. (JP) 2000-07-05 EP disclosed
EP-0035724-B1 PROCESS FOR MANUFACTURING 1,1-DIHALOGENATED ALKENES BAYER AG (DE) 1983-05-18 EP disclosed
EP-0000345-A1 Substituted phenoxybenzyloxycarbonyl derivatives, their preparation and their use as insecticides and acaricides BAYER AG (DE) 1979-01-24 EP disclosed