Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL111454 | 0.79 | MAPT (0.32) | MAPT | |
| SCHEMBL14267000 | 0.79 | — | — | |
| SCHEMBL18819679 | 0.75 | ADRB2 (0.31) | — | |
| SCHEMBL10127285 | 0.74 | — | — | |
| SCHEMBL14266979 | 0.74 | NR1H2 (0.33) | — | |
| SCHEMBL14267001 | 0.72 | HSD11B1 (0.36) | — | |
| SCHEMBL14266980 | 0.72 | — | — | |
| SCHEMBL10305841 | 0.71 | MAPT (0.33) | MAPT | |
| SCHEMBL25235109 | 0.69 | TP53 (0.47) | MAPT | |
| SCHEMBL2681018 | 0.68 | TSHR (0.33) | CAPN9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7326516-B2 | Resist composition for immersion exposure and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-02-05 | — | — | US | disclosed |
| US-7323286-B2 | Photosensitive composition, compound used in the same, and patterning method using the same | FUJIFILM CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |