Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15250900 | 0.81 | ALDH1A1 (0.48) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL13034086 | 0.81 | ALDH1A1 (0.48) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL11618596 | 0.80 | ALDH1A1 (0.50) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL12800030 | 0.78 | TDP1 (0.58) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL28688624 | 0.78 | TDP1 (0.47) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL15542421 | 0.77 | ALDH1A1 (0.44) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL476953 | 0.77 | TDP1 (0.41) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL21603032 | 0.75 | TDP1 (0.48) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL28501027 | 0.75 | ALDH1A1 (0.42) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL21183332 | 0.74 | TDP1 (0.53) | TDP1ALDH1A1LMNAHSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1006 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | claimed |
| CN-122095070-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122095069-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| CN-122070516-A | Negative photosensitive composition, photosensitive resist film, method for producing hollow structure, and method for forming pattern | 东京应化工业株式会社 | 2026-05-19 | — | — | CN | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-6054545-A | CELLULOSE MODIFIED WITH CARBOXYLATED ISOCYANATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-04-25 | — | — | US | disclosed |
| US-5924912-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5916738-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0894808-A1 | Modified cellulose compound and photopolymerizable resin composition containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| CN-1140843-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRIC CORP (JP) | 1997-01-22 | — | — | CN | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | TDP1 2306/4885ALDH1A1 1639/4885LMNA 1064/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | TDP1 1452/4885ALDH1A1 2680/4885LMNA 3028/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.