Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 5/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.32 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.32 |
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.32 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11618596 | 0.85 | ALDH1A1 (0.50) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL29100680 | 0.82 | ALDH1A1 (0.31) | TDP1ALDH1A1LMNATSHRALOX15 | |
| SCHEMBL8985841 | 0.80 | TDP1 (0.39) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL21603032 | 0.80 | TDP1 (0.48) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL15502436 | 0.78 | TDP1 (0.38) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL138619 | 0.78 | ALOX15 (0.46) | ALDH1A1LMNAHSD17B10TSHRALOX15 | |
| SCHEMBL15837553 | 0.78 | TDP1 (0.45) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL6783950 | 0.78 | TDP1 (0.45) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL28470346 | 0.77 | ALDH1A1 (0.39) | TDP1ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL142900 | 0.77 | TDP1 (0.41) | TDP1ALDH1A1LMNAHSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 259 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| US-12281254-B2 | Alumina-based thermally conductive oxide and method for producing same | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2025-04-22 | — | — | US | disclosed |
| CN-118033978-B | Dual-color photoetching bottom anti-reflection coating and preparation method thereof | 上海英迈特材料科技有限公司 | 2025-02-14 | — | — | CN | disclosed |
| WO-2025011754-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2025-01-16 | — | — | WO | disclosed |
| EP-4114825-B1 | OXIME ESTER PHOTOINITIATORS | BASF SE (DE) | 2024-11-20 | — | — | EP | disclosed |
| WO-2024203732-A1 | ELECTROMAGNETIC WAVE ABSORBER AND PASTE FOR FORMING ELECTROMAGNETIC WAVE ABSORBER | 国立大学法人 東京大学 | 2024-10-03 | — | — | WO | disclosed |
| CN-113316744-B | Oxime ester photoinitiators with special aroyl chromophores | 巴斯夫欧洲公司 | 2024-07-30 | — | — | CN | disclosed |
| US-20240199913-A1 | METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-113462278-B | Varnish composition, method for producing polyimide resin, and additive | 东京应化工业株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-118033978-A | Dual-color photoetching bottom anti-reflection coating and preparation method thereof | 上海英迈特材料科技有限公司 | 2024-05-14 | — | — | CN | disclosed |
| US-5885746-A | COMPRISING A POLYMER BINDER, A MONOMER, A PHOTOINITIATOR ACTIVATED BY VISIBLE LASER LIGHT, A PHOTOSENSITIVE ACID-GENERATING AGENT AND A CHROMOGEN; OFFSET PRINTING; STORAGE STABILITY; RESOLUTION; MATERIALS HANDLING; EFFICIENCY | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| EP-0894808-A1 | Modified cellulose compound and photopolymerizable resin composition containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5776995-A | PHOTOPOLYMERIZABLE URETHANE (METH)ACRYLATE COMPOUND, ALKALI-SOLUBLE POLYMER, PHOTOPOLYMERIZATION INITIATOR, COMPLEX OF ALKALI THIOCYANTE WITH POLYETHER | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0793406-A1 | Process for producing multilayer wiring boards | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0770923-A1 | Photosensitive resin composition and photosensitive resin laminated film containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-05-02 | — | — | EP | disclosed |
| CN-1140843-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRIC CORP (JP) | 1997-01-22 | — | — | CN | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
| EP-0720053-A2 | Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-07-03 | — | — | EP | disclosed |