⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL1813543 | 0.96 | — | — | |
| Boric Acid SCHEMBL3344162 | 0.89 | — | — | |
| Acetic Acid SCHEMBL10404847 | 0.80 | FFAR3 (0.41) | — | |
| SCHEMBL8258247 | 0.70 | — | — | |
| SCHEMBL133066 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL634629 | 0.65 | TSHR (0.41) | — | |
| Ammonia Solution, Strong SCHEMBL5393633 | 0.65 | TSHR (0.41) | — | |
| Iodide SCHEMBL5874477 | 0.65 | TSHR (0.41) | — | |
| Bromide SCHEMBL5874693 | 0.65 | TSHR (0.41) | — | |
| SCHEMBL6325632 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2946 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250381173-A1 | Long-Lasting Anaesthetic Formulation | BERTIE INT AB (SE) | 2025-12-18 | — | — | US | claimed |
| US-20250383599-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION | YCCHEM CO LTD (KR) | 2025-12-18 | — | — | US | claimed |
| US-12448542-B2 | Slurry composition for polishing organic film | KCTECH CO., LTD. (KR) | 2025-10-21 | — | — | US | claimed |
| EP-4607277-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199406-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| US-12305079-B2 | CMP slurry composition for polishing polycrystalline silicon and polishing method using same | KCTECH CO., LTD. (KR) | 2025-05-20 | — | — | US | claimed |
| US-20250145859-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING | KCTECH CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| CN-119869183-A | Flaky high-specific-surface-area calcium hydroxide flue gas desulfurizing agent and preparation method and application thereof | 山东力净环保科技有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119822972-A | Dendritic multi-adsorption site clay stabilizer and preparation method thereof | 中国石油化工股份有限公司 | 2025-04-15 | — | — | CN | claimed |
| CN-119764360-A | Graphite composite material, preparation method thereof, negative electrode and battery | 惠州比亚迪电池有限公司 | 2025-04-04 | — | — | CN | claimed |
| US-4971630-A | LIQUID MIXTURE FOR SPRAYING FROM AIRCRAFT | PBI/GORDON CORPORATION (US) | 1990-11-20 | — | — | US | claimed |
| EP-0149490-B1 | PRESENSITIZED PLATE HAVING AN ANODIZED ALUMINUM BASE WITH AN IMPROVED HYDROPHILIC LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1989-04-26 | — | — | EP | claimed |
| US-4759861-A | Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt | NIPPON OIL CO., LTD. (JP) | 1988-07-26 | — | — | US | claimed |
| US-4748011-A | Method and apparatus for sweetening natural gas | BAKER HUGHES INCORPORATED | 1988-05-31 | — | — | US | claimed |
| EP-0149490-A2 | Presensitized plate having an anodized aluminum base with an improved hydrophilic layer | FUJI PHOTO FILM CO., LTD. (JP) | 1985-07-24 | — | — | EP | claimed |
| US-4291148-A | Process for preparation of a phenolic-polybutadiene-HCHO resin composition useful for laminated sheet | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1981-09-22 | — | — | US | claimed |
| US-RE30670-E | NEGATIVE-ACTING; BASE LAYER, SLIGHTLY CROSSLINKED POLYSILOXANE LAYER, AND LAYER CONTAINING PHOTOPOLYMERIZABLE COMPOUND | TORAY INDUSTRIES, INC. (JP) | 1981-07-07 | — | — | US | claimed |
| US-4219624-A | Stabilization of amine catalysts in a composition with halogenated polyols for use in polyurethane foam production | OLIN CORPORATION (US) | 1980-08-26 | — | — | US | claimed |
| US-4086093-A | POLYSILOXANE, PHOTOADHESIVE, PHOTOPOLYMERIZABLE | TORAY INDUSTRIES, INC. (JA) | 1978-04-25 | — | — | US | claimed |
| US-3980579-A | FOR PREPARATION OF POLYURETHANE FOAMS; TERTIARY AMINE, SULFUR-CONTAINING ORGANOTIN COMPOUND | OLIN CORPORATION (US) | 1976-09-14 | — | — | US | claimed |