Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30539 | 0.96 | TSHR (0.44) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Fluoride SCHEMBL923685 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL28587072 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL29183872 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Water SCHEMBL1246621 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL5393633 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL28878844 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Methane SCHEMBL1001960 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Bromide SCHEMBL5874693 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Hydrochloric Acid SCHEMBL634629 | 0.93 | TSHR (0.41) | TSHRMAPK1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |