SCHEMBL14414914

SCHEMBL14414914

O=C(O)c1cccc(-c2cnn[nH]2)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CD74 P04233 1/20 0.60
▸ MIF P14174 1/20 0.60
▸ KMO O15229 2/20 0.51
▸ MAP2K4 P45985 2/20 0.49
▸ MAPK1 P28482 1/20 0.49
▸ MAPKAPK3 Q16644 1/20 0.49
▸ MAPK6 Q16659 1/20 0.49
▸ KEAP1 Q14145 1/20 0.47
▸ RXRA P19793 2/20 0.46
▸ RXRB P28702 2/20 0.46
▸ DDT P30046 1/20 0.46
▸ KDM4E B2RXH2 2/20 0.44
▸ ALDH1A1 P00352 2/20 0.44
▸ NPC1 O15118 1/20 0.44
▸ HPGD P15428 1/20 0.44
▸ RAB9A P51151 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ ERN1 O75460 1/20 0.44
▸ AXL P30530 2/20 0.44
▸ POLB P06746 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21857459 0.75 KDM4E (0.38) CD74MIFKDM4EALDH1A1SMN1; SMN2
SCHEMBL940610 0.75 IDO1 (0.59) CD74MIFKMORXRARXRB
SCHEMBL29904709 0.74 KMO (0.86) CD74MIFKMOKEAP1RXRA
SCHEMBL71238 0.74 KMO (0.86) CD74MIFKMOKEAP1RXRA
SCHEMBL30725957 0.74 KMO (0.86) CD74MIFKMOKEAP1RXRA
SCHEMBL20497344 0.74 AOC3 (0.45) MAPK1AXL
SCHEMBL30171029 0.73 IDO1 (0.54) MAPK1ALDH1A1HPGDSMN1; SMN2
Hydrochloric Acid SCHEMBL21173951 0.72 KMO (0.83) CD74MIFKMOKEAP1RXRA
Fluoride SCHEMBL21332075 0.72 KMO (0.83) CD74MIFKMOKEAP1RXRA
Hydrochloric Acid SCHEMBL4350309 0.72 KMO (0.83) CD74MIFKMOKEAP1RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070224806-A1 Metal polishing slurry FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
US-20070224806-A1 Metal polishing slurry FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
EP-1837903-A2 Metal polishing slurry FUJIFILM Corporation (JP) 2007-09-26 — — EP disclosed
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