Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.48 |
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | PRKCA | P17252 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12582664 | 0.91 | ALDH1A1 (0.52) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL7773025 | 0.85 | ALDH1A1 (0.46) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL1470162 | 0.84 | ALDH1A1 (0.46) | ALDH1A1LMNAHSD17B10TDP1PRKCA | |
| SCHEMBL13384979 | 0.83 | ALDH1A1 (0.43) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL5790139 | 0.83 | ALDH1A1 (0.44) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL4798393 | 0.83 | ALDH1A1 (0.57) | ALDH1A1LMNAHSD17B10TSHRSMN1; SMN2 | |
| SCHEMBL15136069 | 0.83 | ALDH1A1 (0.33) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL28058899 | 0.82 | LMNA (0.43) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL1469881 | 0.81 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL450002 | 0.81 | ALDH1A1 (0.38) | ALDH1A1LMNATSHRTDP1PRKCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | claimed |
| CN-114539524-A | Photosensitive resin precursor polymer, photosensitive resin composition paste and use thereof | 吉林奥来德光电材料股份有限公司 | 2022-05-27 | — | — | CN | claimed |
| US-8168689-B2 | High optical contrast pigment and colorful photosensitive composition employing the same and fabrication method thereof | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2012-05-01 | — | — | US | claimed |
| US-20090085016-A1 | HIGH OPTICAL CONTRAST PIGMENT AND COLORFUL PHOTOSENSITIVE COMPOSITION EMPLOYING THE SAME AND FABRICATION METHOD THEREOF | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-04-02 | — | — | US | claimed |
| CN-122095070-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122095069-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| EP-0894808-A1 | Modified cellulose compound and photopolymerizable resin composition containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5776995-A | PHOTOPOLYMERIZABLE URETHANE (METH)ACRYLATE COMPOUND, ALKALI-SOLUBLE POLYMER, PHOTOPOLYMERIZATION INITIATOR, COMPLEX OF ALKALI THIOCYANTE WITH POLYETHER | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0793406-A1 | Process for producing multilayer wiring boards | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0770923-A1 | Photosensitive resin composition and photosensitive resin laminated film containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-05-02 | — | — | EP | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | ALDH1A1 1639/4885LMNA 1064/4885HSD17B10 3064/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | ALDH1A1 2680/4885LMNA 3028/4885HSD17B10 4748/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.