SCHEMBL14461599

SCHEMBL14461599

CC(COc1ccccc1)OCc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.53
▸ PTGS1 P23219 2/20 0.49
▸ MAOA P21397 2/20 0.49
▸ ALDH1A1 P00352 3/20 0.45
▸ SMN1; SMN2 Q16637 3/20 0.45
▸ TSHR P16473 2/20 0.45
▸ SLC6A2 P23975 2/20 0.45
▸ SLC6A3 Q01959 2/20 0.45
▸ CYP1A2 P05177 2/20 0.45
▸ CYP2C19 P33261 2/20 0.45
▸ CYP2D6 P10635 2/20 0.45
▸ SLC22A2 O15244 1/20 0.45
▸ SLC22A1 O15245 1/20 0.45
▸ SLC22A3 O75751 1/20 0.45
▸ ESR1 P03372 1/20 0.45
▸ CHRM2 P08172 1/20 0.45
▸ HTR1A P08908 1/20 0.45
▸ ADRA2A P08913 1/20 0.45
▸ ADORA3 P0DMS8 1/20 0.45
▸ CHRM1 P11229 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3507472 0.90 AOC3 (0.49) LMNAPTGS1SMN1; SMN2TSHRSLC6A2
SCHEMBL4701130 0.83 TSHR (0.48) LMNAPTGS1SMN1; SMN2TSHRSLC6A2
SCHEMBL10695387 0.83 LMNA (0.54) LMNAPTGS1MAOASMN1; SMN2SLC6A2
SCHEMBL21985397 0.82 SIGMAR1 (0.51) LMNAPTGS1SMN1; SMN2SLC6A2SLC6A3
SCHEMBL14461610 0.82 LMNA (0.50) LMNAPTGS1MAOAALDH1A1SMN1; SMN2
SCHEMBL12269248 0.81 LMNA (0.57) LMNAPTGS1MAOAALDH1A1SMN1; SMN2
SCHEMBL3421389 0.81 MAPT (0.43) ALDH1A1TSHRCYP1A2CYP2C19CYP2D6
SCHEMBL18427254 0.81 MAPT (0.43) ALDH1A1TSHRCYP1A2CYP2C19CYP2D6
SCHEMBL8670088 0.81 LMNA (0.47) LMNAPTGS1MAOASMN1; SMN2TSHR
SCHEMBL5471268 0.81 TSHR (0.54) TSHRKMT2ATDP1MAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 — — US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 — — US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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