SCHEMBL14461925

SCHEMBL14461925

Cc1cc(Cc2ccc(O)cc2)c(O)c(Sc2c(O)c(C)cc(Cc3ccc(O)cc3)c2O)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 2/20 0.37
ERBB2 P04626 2/20 0.37
IDH1 O75874 2/20 0.36
AMY1A P0DUB6 1/20 0.36
ESR1 P03372 2/20 0.34
ESR2 Q92731 1/20 0.34
KEAP1 Q14145 1/20 0.34
MET P08581 1/20 0.33
CYP19A1 P11511 1/20 0.33
HSPA5 P11021 1/20 0.33
CYP2C9 P11712 2/20 0.32
CYP2C19 P33261 2/20 0.32
HIF1A Q16665 2/20 0.32
CYP2D6 P10635 1/20 0.32
HSD17B10 Q99714 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
THRA P10827 1/20 0.32
THRB P10828 1/20 0.32
MEN1 O00255 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19621130 0.87 EGFR (0.42) EGFRERBB2IDH1AMY1AESR1
SCHEMBL13609019 0.87 AMY1A (0.42) EGFRERBB2IDH1AMY1AESR1
SCHEMBL8680810 0.79 EGFR (0.49) EGFRERBB2IDH1AMY1AESR1
SCHEMBL4064619 0.77 AMY1A (0.55) EGFRERBB2IDH1AMY1AESR1
SCHEMBL4055683 0.76 AMY1A (0.58) EGFRERBB2IDH1AMY1AESR1
SCHEMBL4058592 0.76 AMY1A (0.58) EGFRERBB2IDH1AMY1AESR1
SCHEMBL1904779 0.75 BCL2 (0.47) AMY1A
SCHEMBL4061628 0.75 SHBG (0.51) EGFRERBB2IDH1AMY1AESR1
SCHEMBL28680998 0.74 ESR1 (0.48) IDH1ESR1ESR2KEAP1CYP19A1
SCHEMBL19314087 0.73 ESR1 (0.46) IDH1ESR1ESR2KEAP1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed