SCHEMBL14489012

SCHEMBL14489012

CCC(C)(C)C(=O)OCCCCCOC1CCOC1=O

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FKBP1A P62942 2/20 0.40
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
HPGD P15428 1/20 0.39
HSD17B10 Q99714 1/20 0.39
NTSR1 P30989 1/20 0.34
ATM Q13315 1/20 0.34
POLB P06746 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C9 P11712 1/20 0.33
MAPK1 P28482 1/20 0.33
CYP2C19 P33261 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PRKCA P17252 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13779634 0.99 FKBP1A (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779635 0.96 KDM4E (0.39) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779638 0.91 KDM4E (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779631 0.88 KDM4E (0.39) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779639 0.88 KDM4E (0.39) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779624 0.86 KDM4E (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779626 0.86 KDM4E (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779628 0.84 KDM4E (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL14489013 0.84 ALDH1A1 (0.41) FKBP1AKDM4EALDH1A1HPGDHSD17B10
SCHEMBL13779612 0.83 KDM4E (0.42) FKBP1AKDM4EALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed