SCHEMBL14489013

SCHEMBL14489013

CCC(C)(C)C(=O)OCOC1CCOC1=O

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
HPGD P15428 2/20 0.41
KDM4E B2RXH2 2/20 0.41
HSD17B10 Q99714 1/20 0.41
FKBP1A P62942 2/20 0.40
MAPK1 P28482 4/20 0.37
GAA P10253 1/20 0.37
POLB P06746 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
NTSR1 P30989 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13779638 0.88 KDM4E (0.41) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779634 0.85 FKBP1A (0.41) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779635 0.85 KDM4E (0.39) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL14489012 0.84 FKBP1A (0.40) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779639 0.84 KDM4E (0.39) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779631 0.84 KDM4E (0.39) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL47499 0.82 ALDH1A1 (0.48) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL47503 0.81 KDM4E (0.45) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779623 0.81 ALDH1A1 (0.45) ALDH1A1HPGDKDM4EHSD17B10FKBP1A
SCHEMBL13779627 0.79 KDM4E (0.44) ALDH1A1HPGDKDM4EHSD17B10FKBP1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244357-B2 Method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US disclosed
US-20140205956-A1 METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD (JP) 2014-07-24 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed