Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11592267 | 0.85 | GAA (0.38) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL7636622 | 0.85 | GAA (0.43) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL12776907 | 0.85 | GAA (0.43) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL13121096 | 0.83 | GAA (0.37) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL15489679 | 0.83 | ALDH1A1 (0.44) | GAAALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL28318222 | 0.83 | GAA (0.41) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL12776906 | 0.81 | ALDH1A1 (0.41) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL12776914 | 0.81 | ALDH1A1 (0.41) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL20355314 | 0.79 | GAA (0.34) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL751990 | 0.79 | GAA (0.34) | GAAALDH1A1LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 918 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050069504-A1 | Coating for nail care having antimicrobial properties | BEAURLINE DANIEL J (US) | 2005-03-31 | — | — | US | claimed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | claimed |
| US-6623909-B2 | Polysiloxane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-23 | — | — | US | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| WO-2003045339-A2 | COATING FOR NAIL CARE HAVING ANTIMICROBIAL PROPERTIES | ALMELL, LTD. (US) | 2003-06-05 | — | — | WO | claimed |
| US-6461789-B1 | NOVEL POLYMER HAVING HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADIATION OF UP TO 300 NANOMETERS; RESIST MATERIALS HAVE SUFFICIENT TRANSPARENCY IN REGION OF EXCIMER LASERS, AND SATISFY RESOLUTION AND SENSITIVITY REQUIREMENTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-08 | — | — | US | claimed |
| US-6461790-B1 | NOVEL POLYMER HAVING HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADIATION OF UP TO 300 NANOMETERS; RESIST MATERIALS HAVE SUFFICIENT TRANSPARENCY IN REGION OF EXCIMER LASER AND SATISFY RESOLUTION AND SENSITIVITY REQUIREMENTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-08 | — | — | US | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| US-12291690-B2 | Ethers and esters of tertiary alkanols for use as aroma chemicals | BASF SE (DE) | 2025-05-06 | — | — | US | disclosed |
| US-20240241442-A1 | Positive Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-12013639-B2 | Positive resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-18 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240168378-A1 | Positive Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-23 | — | — | US | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| EP-0812180-A4 | NAIL COATING COMPOSITION | ALMELL LTD (US) | 1999-03-31 | — | — | EP | disclosed |
| US-5720804-A | CELLULOSE ESTER AND PLURALITY OF SOLVENTS | ALMELL, LTD. (US) | 1998-02-24 | — | — | US | disclosed |
| EP-0812180-A1 | NAIL COATING COMPOSITION | ALMELL, LTD. (US) | 1997-12-17 | — | — | EP | disclosed |
| US-5662891-A | RESINS WITH NITROCELLULOSE, MALEIC MODIFIED ROSIN AND POLYESTERS FOR FILMS FOR NAILS | ALMELL, LTD. (US) | 1997-09-02 | — | — | US | disclosed |
| WO-1997024103-A1 | NAIL COATING COMPOSITION | ALMELL, LTD. (US) | 1997-07-10 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12291690-B2 | Ethers and esters of tertiary alkanols for use as aroma chemicals | OR51E2, ETV1, ALK | GAA 2737/4885ALDH1A1 71/4885LMNA 1511/4885 |
| US-20240168378-A1 | Positive Resist Material And Patterning Process | HNRNPU, DSTN, NSUN2 | GAA 4559/4885ALDH1A1 3565/4885LMNA 4150/4885 |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | ADAR, HNRNPU, POLQ | GAA 3104/4885ALDH1A1 4624/4885LMNA 1013/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.