SCHEMBL14574032

SCHEMBL14574032

CCCOC(=O)CCC1(C)OC(=O)C(=C/C=C/C=C/Nc2ccccc2)C(=O)O1

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.37
▸ TOP2A P11388 2/20 0.35
▸ GAA P10253 2/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ MAPT P10636 4/20 0.34
▸ LMNA P02545 2/20 0.34
▸ TP53 P04637 1/20 0.34
▸ KMT2A Q03164 3/20 0.32
▸ HPGD P15428 2/20 0.32
▸ POLB P06746 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ RAB9A P51151 2/20 0.32
▸ MEN1 O00255 2/20 0.31
▸ MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14574031 0.92 ALDH1A1 (0.38) ALDH1A1TOP2AGAASMN1; SMN2MAPT
SCHEMBL14574022 0.88 ALDH1A1 (0.38) ALDH1A1GAAMAPTKMT2AHPGD
SCHEMBL14196985 0.84 ALDH1A1 (0.46) ALDH1A1GAASMN1; SMN2MAPTLMNA
SCHEMBL14574025 0.80 ALDH1A1 (0.48) ALDH1A1GAASMN1; SMN2MAPTLMNA
SCHEMBL14574020 0.76 ALDH1A1 (0.62) ALDH1A1GAASMN1; SMN2LMNAKMT2A
SCHEMBL14574027 0.74 RAB9A (0.41) ALDH1A1SMN1; SMN2MAPTKMT2APOLB
SCHEMBL14574021 0.71 ALDH1A1 (0.44) ALDH1A1GAASMN1; SMN2MAPTLMNA
SCHEMBL12260834 0.70 ALDH1A1 (0.66) ALDH1A1GAASMN1; SMN2LMNAKMT2A
SCHEMBL14574026 0.70 ALDH1A1 (0.48) ALDH1A1GAASMN1; SMN2MAPTLMNA
SCHEMBL12715233 0.70 PRKCA (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7183422-B2 Oxonol compound and process for producing the compound FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 — — US disclosed
US-7183422-B2 Oxonol compound and process for producing the compound FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 — — US disclosed
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