SCHEMBL14588673

SCHEMBL14588673

CCCOn1nnc2ccccc2c1=O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.57
SMN1; SMN2 Q16637 3/20 0.50
NPC1 O15118 3/20 0.50
RAB9A P51151 3/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
HPSE Q9Y251 1/20 0.49
CYP1A2 P05177 1/20 0.49
CYP2C19 P33261 1/20 0.49
TSHR P16473 2/20 0.48
MAPT P10636 4/20 0.44
LMNA P02545 3/20 0.44
KDM4E B2RXH2 1/20 0.44
CYP3A4 P08684 1/20 0.44
HPGD P15428 1/20 0.44
ALOX15 P16050 1/20 0.44
MAPK1 P28482 1/20 0.44
HSD17B10 Q99714 1/20 0.44
POLB P06746 1/20 0.44
NPY1R P25929 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14588678 0.90 HPSE (0.55) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL10284047 0.88 ALDH1A1 (0.56) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL19201786 0.81 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL19201781 0.80 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL757021 0.79 ALDH1A1 (0.56) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL1562841 0.78 HPSE (0.60) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL22749218 0.78 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL14620595 0.78 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL9483441 0.78 TSHR (0.63) SMN1; SMN2NPC1RAB9AMEN1KMT2A
SCHEMBL1058740 0.77 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed