SCHEMBL14620595

SCHEMBL14620595

CCS(=O)(=O)On1nnc2ccccc2c1=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.52
SMN1; SMN2 Q16637 3/20 0.48
CYP1A2 P05177 1/20 0.48
CYP2C19 P33261 1/20 0.48
NPC1 O15118 3/20 0.46
RAB9A P51151 3/20 0.46
HPSE Q9Y251 1/20 0.46
KMT2A Q03164 3/20 0.46
MEN1 O00255 2/20 0.46
MAPT P10636 3/20 0.45
LMNA P02545 3/20 0.43
MAPK1 P28482 2/20 0.43
KDM4E B2RXH2 2/20 0.43
CYP3A4 P08684 1/20 0.43
HPGD P15428 1/20 0.43
ALOX15 P16050 1/20 0.43
TSHR P16473 1/20 0.43
HSD17B10 Q99714 1/20 0.43
GAA P10253 1/20 0.42
HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14620598 0.88 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL4012048 0.85 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL10284047 0.80 ALDH1A1 (0.56) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL11450683 0.79 ALDH1A1 (0.45) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL757021 0.78 ALDH1A1 (0.56) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL14588673 0.78 ALDH1A1 (0.57) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL5379701 0.77 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL22749218 0.77 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL1562841 0.77 HPSE (0.60) ALDH1A1SMN1; SMN2CYP1A2CYP2C19NPC1
SCHEMBL14620099 0.76 KMT2A (0.51) ALDH1A1SMN1; SMN2CYP1A2CYP2C19KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed