SCHEMBL14601975

SCHEMBL14601975

C=C(C)C(=O)OC1C2OC3C(COC31)C2CO

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14602075 0.87 ALDH1A1 (0.39) ALDH1A1
SCHEMBL14601974 0.86 ALDH1A1 (0.41) ALDH1A1
SCHEMBL14602067 0.83
SCHEMBL14602022 0.82
SCHEMBL14602076 0.78 ALDH1A1 (0.38) ALDH1A1
SCHEMBL14601978 0.77 ALDH1A1 (0.34) ALDH1A1
SCHEMBL14602063 0.74 ALDH1A1 (0.32) ALDH1A1
SCHEMBL19026750 0.74 ALDH1A1 (0.36) ALDH1A1
SCHEMBL14602038 0.73 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14602014 0.73 NR3C1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed