SCHEMBL14602014

SCHEMBL14602014

C=CC(=O)OC1C2OC3C(COC31)C2COC(C)=O

nearest known ligand 0.31

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NR3C1 P04150 1/20 0.31
FYN P06241 1/20 0.31
ADRA2A P08913 1/20 0.31
ADORA3 P0DMS8 1/20 0.31
ADRA2B P18089 1/20 0.31
DRD4 P21917 1/20 0.31
DRD3 P35462 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14602023 0.87
SCHEMBL14601992 0.86 NLRP3 (0.31) ALDH1A1
SCHEMBL14601974 0.85 ALDH1A1 (0.41) NR3C1FYNADRA2AADORA3ADRA2B
SCHEMBL14602022 0.84
SCHEMBL14602038 0.80 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14601993 0.80 ALDH1A1 (0.30) ALDH1A1
SCHEMBL14602104 0.74 ALDH1A1 (0.34) ALDH1A1
SCHEMBL14601973 0.74
SCHEMBL14602075 0.73 ALDH1A1 (0.39) ALDH1A1
SCHEMBL14601975 0.73 ALDH1A1 (0.38) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed