Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24670441 | 0.88 | MAPK1 (0.30) | — | |
| SCHEMBL17617953 | 0.81 | — | — | |
| SCHEMBL13088042 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL9975636 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL22840948 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL47307 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL19719271 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL15166539 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL172062 | 0.79 | — | — | |
| SCHEMBL13607339 | 0.75 | HMGCR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9658532-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-9658532-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20170010537-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20170010537-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9201304-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9201304-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20130209935-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130209935-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130071788-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130071788-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |