SCHEMBL14616278

SCHEMBL14616278

COCO[C@@H]1CO[C@H]2[C@@H]1OC[C@@H]2O

nearest known ligand 0.48

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.48
LMNA P02545 1/20 0.48
MAPT P10636 1/20 0.46
BCHE P06276 3/20 0.38
ERBB2 P04626 1/20 0.30
EPHA2 P29317 1/20 0.30
KDR P35968 1/20 0.30
EPHB4 P54760 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17616928 1.00 THRB (0.48) THRBLMNAMAPTBCHEERBB2
SCHEMBL17616940 1.00 THRB (0.48) THRBLMNAMAPTBCHEERBB2
SCHEMBL17616932 1.00 THRB (0.48) THRBLMNAMAPTBCHEERBB2
SCHEMBL17616930 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616934 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616939 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616933 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616938 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616931 0.88 ALDH1A1 (0.35) BCHE
SCHEMBL17616936 0.88 ALDH1A1 (0.35) BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9815934-B2 Isohexide-diacetal based polymers and a process thereof COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) 2017-11-14 US disclosed
US-20160083506-A1 ISOHEXIDE-DIACETAL BASED POLYMERS AND A PROCESS THEREOF COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2016-03-24 US disclosed
US-8999630-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-07 US disclosed
US-8999630-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-07 US disclosed
US-8795946-B2 Polymerizable ester compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-8795946-B2 Polymerizable ester compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-20130017484-A1 POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017492-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017492-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017484-A1 POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130017484-A1 POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS RER1, DOT1L, H1-0 THRB 2699/4885LMNA 1178/4885MAPT 2329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.