SCHEMBL14616378

SCHEMBL14616378

CCC(C)(C)C(=O)OC1COC2C(OCOC3CCCCC3)COC12

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
BCHE P06276 9/20 0.37
KLK7 P49862 3/20 0.36
EPHX1 P07099 1/20 0.32
KLK5 Q9Y337 2/20 0.32
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14617360 0.83 BCHE (0.41) BCHEKLK7KLK5
SCHEMBL14616402 0.82 BCHE (0.36) BCHEKLK7
SCHEMBL13829296 0.80 BCHE (0.39) BCHEKLK7KLK5
SCHEMBL15978093 0.80 BCHE (0.39) BCHEKLK7KLK5
SCHEMBL14616406 0.80 BCHE (0.36) BCHEKLK7
SCHEMBL14616373 0.79 BCHE (0.38) BCHEKLK7KLK5
SCHEMBL14728743 0.79 MEN1 (0.34) BCHEKLK7
SCHEMBL14616311 0.78 BCHE (0.34) BCHEKLK7
SCHEMBL14617351 0.78 ALDH1A1 (0.36) BCHEKLK7EPHX1KLK5
SCHEMBL14617331 0.78 ALDH1A1 (0.36) BCHEKLK7EPHX1KLK5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999630-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-07 US disclosed
US-8822136-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-02 US disclosed
US-8790866-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-29 US disclosed
US-20130108960-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed
US-20130052587-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-02-28 US disclosed
US-20130017492-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed