Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14616287 | 0.83 | BCHE (0.34) | BCHEKLK7 | |
| SCHEMBL14616375 | 0.82 | CYP3A4 (0.36) | BCHEKLK7 | |
| SCHEMBL14617360 | 0.82 | BCHE (0.41) | BCHEKLK7 | |
| SCHEMBL14616378 | 0.82 | BCHE (0.37) | BCHEKLK7 | |
| SCHEMBL14616311 | 0.82 | BCHE (0.34) | BCHEKLK7 | |
| SCHEMBL15978093 | 0.79 | BCHE (0.39) | BCHEKLK7 | |
| SCHEMBL13829296 | 0.79 | BCHE (0.39) | BCHEKLK7 | |
| SCHEMBL14616406 | 0.79 | BCHE (0.36) | BCHEKLK7 | |
| SCHEMBL14616373 | 0.78 | BCHE (0.38) | BCHEKLK7 | |
| SCHEMBL14728743 | 0.78 | MEN1 (0.34) | BCHEKLK7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999630-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8822136-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8790866-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |