SCHEMBL14616636

SCHEMBL14616636

CS(=O)(=O)NS(=O)(=O)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.38
SCN9A Q15858 2/20 0.33
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
GRIN2D O15399 1/20 0.31
GRIN3B O60391 1/20 0.31
GRIN1 Q05586 1/20 0.31
GRIN2A Q12879 1/20 0.31
GRIN2B Q13224 1/20 0.31
GRIN2C Q14957 1/20 0.31
GRIN3A Q8TCU5 1/20 0.31
LMNA P02545 1/20 0.31
EPHX2 P34913 2/20 0.31
CNR2 P34972 1/20 0.31
CA2 P00918 2/20 0.30
CA12 O43570 1/20 0.30
CA7 P43166 1/20 0.30
CA9 Q16790 1/20 0.30
CA14 Q9ULX7 1/20 0.30
GLA P06280 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13608630 0.77 NPSR1 (0.45) NPSR1SCN9ATSHRSMN1; SMN2GRIN2D
SCHEMBL18195873 0.77 NPSR1 (0.32) NPSR1
SCHEMBL24361303 0.73 ALDH1A1 (0.41) SCN9A
Trimethylammonium SCHEMBL21268519 0.72 NPSR1 (0.41) NPSR1TSHRSMN1; SMN2GRIN2DGRIN3B
SCHEMBL14616638 0.70 SMN1; SMN2 (0.42) NPSR1SCN9ATSHRSMN1; SMN2LMNA
SCHEMBL27338834 0.69 NPSR1 (0.42) NPSR1TSHRSMN1; SMN2LMNACNR2
SCHEMBL21923024 0.69 GRIN2D (0.34) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL14015367 0.69 NPSR1 (0.40) NPSR1TSHRGRIN2DGRIN3BGRIN1
SCHEMBL18663525 0.69 NPSR1 (0.40) NPSR1TSHRSMN1; SMN2GRIN2DGRIN3B
SCHEMBL16857421 0.68 NPSR1 (0.41) NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed