SCHEMBL21923024

SCHEMBL21923024

CS(=O)(=O)NS(=O)(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 2/20 0.34
GRIN3B O60391 2/20 0.34
GRIN1 Q05586 2/20 0.34
GRIN2A Q12879 2/20 0.34
GRIN2B Q13224 2/20 0.34
GRIN2C Q14957 2/20 0.34
GRIN3A Q8TCU5 2/20 0.34
LMNA P02545 1/20 0.33
GAA P10253 1/20 0.32
EPHX2 P34913 5/20 0.32
EPHX1 P07099 2/20 0.31
ALDH1A1 P00352 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16140246 0.86 GAA (0.37) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL9001234 0.74 GAA (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL15426640 0.74 CA1 (0.32) LMNAALDH1A1
SCHEMBL21943824 0.72 EPHX1 (0.34) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL21923040 0.71 EPHX2 (0.37) EPHX2EPHX1ALDH1A1
SCHEMBL14616636 0.69 NPSR1 (0.38) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL21923025 0.69 GBA1 (0.44) LMNAEPHX2ALDH1A1
SCHEMBL17226609 0.68 GRIN2D (0.48) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL26720488 0.68 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL28375490 0.68 GAA (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3644122-B1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2020-12-30 EP disclosed
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-30 US disclosed
EP-3644122-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-04-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SLC6A5, SLC11A2, LARP7 GRIN2D 342/4885GRIN3B 744/4885GRIN1 157/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.