SCHEMBL14616994

SCHEMBL14616994

O=C(OCc1ccccc1[N+](=O)[O-])N(C12CC3CC(CC(C3)C1)C2)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.42
HTT P42858 1/20 0.42
MAOB P27338 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.41
SIGMAR1 Q99720 1/20 0.39
TSHR P16473 1/20 0.38
KMT2A Q03164 2/20 0.38
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
KDM1A O60341 1/20 0.37
HPGD P15428 1/20 0.36
ACHE P22303 1/20 0.36
MMP2 P08253 1/20 0.36
MMP9 P14780 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14930779 0.85 KMT2A (0.35) ALDH1A1HTTMAOBL3MBTL1SIGMAR1
SCHEMBL16661599 0.84 MAOB (0.32) ALDH1A1HTTMAOBL3MBTL1KMT2A
SCHEMBL10925246 0.81 CYP17A1 (0.50) ALDH1A1HTTMAOBL3MBTL1KMT2A
SCHEMBL6329441 0.79 MEN1 (0.46) ALDH1A1HTTL3MBTL1KMT2AMEN1
SCHEMBL20590967 0.75 MAOB (0.53) ALDH1A1HTTMAOBL3MBTL1SIGMAR1
SCHEMBL14616993 0.75 ALDH1A1 (0.49) ALDH1A1HTTMAOBL3MBTL1SIGMAR1
SCHEMBL566539 0.75 MAOB (0.50) ALDH1A1HTTMAOBKMT2AMEN1
SCHEMBL567201 0.74 ALDH1A1 (0.51) ALDH1A1HTTMAOBL3MBTL1SIGMAR1
SCHEMBL10925830 0.73 CNR2 (0.49) ALDH1A1HTTL3MBTL1TSHRKMT2A
SCHEMBL258506 0.73 ALDH1A1 (0.56) ALDH1A1HTTMAOBL3MBTL1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9494866-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-11-15 US disclosed
US-9411224-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-09 US disclosed
US-9405200-B2 Resist composition and method of forming resist pattern TOYKO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-9377685-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-28 US disclosed
US-20150147702-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2015-05-28 US disclosed
US-20150147702-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2015-05-28 US disclosed
US-9029070-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD (JP) 2015-05-12 US disclosed
US-9023585-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD (JP) 2015-05-05 US disclosed
US-20150111155-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2015-04-23 US disclosed
US-8975010-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-10 US disclosed
US-20130177853-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-07-11 US disclosed
US-20130177853-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-07-11 US disclosed
US-20130177854-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-07-11 US disclosed
US-20130164693-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-06-27 US disclosed
US-20130137047-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137047-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-20130115555-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-09 US disclosed
US-20130084523-A1 RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-04 US disclosed
US-20130078572-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-28 US disclosed
US-20130017500-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-01-17 US disclosed