Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | VDR | P11473 | 1/20 | 0.45 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.44 |
| ▸ | FAAH | O00519 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10925830 | 0.85 | CNR2 (0.49) | MEN1KMT2AL3MBTL1MAPTALDH1A1 | |
| SCHEMBL6322953 | 0.84 | THRB (0.46) | MEN1KMT2AL3MBTL1LMNAMAPT | |
| SCHEMBL10925246 | 0.81 | CYP17A1 (0.50) | MEN1KMT2AL3MBTL1MAPTALDH1A1 | |
| SCHEMBL15102775 | 0.80 | DPP8 (0.39) | LMNAMAPTTHRBVDR | |
| SCHEMBL14616994 | 0.79 | ALDH1A1 (0.42) | MEN1KMT2AL3MBTL1ALDH1A1HTT | |
| SCHEMBL13064065 | 0.78 | KMT2A (0.47) | MEN1KMT2ALMNAMAPTEPHX2 | |
| SCHEMBL3360266 | 0.76 | KDM1A (0.51) | MEN1KMT2AL3MBTL1ALDH1A1HTT | |
| SCHEMBL14962141 | 0.75 | MAOB (0.50) | MEN1KMT2AL3MBTL1LMNAALDH1A1 | |
| SCHEMBL31496023 | 0.75 | MAOB (0.53) | MEN1KMT2AL3MBTL1MAPTALDH1A1 | |
| SCHEMBL12089304 | 0.75 | MAOB (0.53) | MEN1KMT2AL3MBTL1MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9494866-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-9029070-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9029070-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9023585-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130137047-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137047-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130115555-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130115555-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20100304297-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20050090570-A1 | Composition for forming dielectric film and method for forming dielectric film or pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-04-28 | — | — | US | disclosed |