Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.63 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.63 |
| ▸ | NPC1 | O15118 | 3/20 | 0.59 |
| ▸ | RAB9A | P51151 | 3/20 | 0.59 |
| ▸ | MEN1 | O00255 | 6/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.56 |
| ▸ | GFER | P55789 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 6/20 | 0.55 |
| ▸ | TP53 | P04637 | 2/20 | 0.55 |
| ▸ | MAPT | P10636 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9811170 | 0.84 | NPC1 (0.56) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL9811167 | 0.84 | NPC1 (0.56) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL14588672 | 0.81 | KDM4E (0.64) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL14620107 | 0.79 | KDM4E (0.51) | KDM4EMEN1KMT2ALMNAL3MBTL1 | |
| SCHEMBL14588671 | 0.78 | LMNA (0.60) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL14620607 | 0.78 | MEN1 (0.59) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL5749492 | 0.74 | NPC1 (1.00) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL5749497 | 0.74 | NPC1 (1.00) | KDM4EMAPK1NPC1RAB9AMEN1 | |
| SCHEMBL14620223 | 0.73 | ALDH1A1 (0.44) | MAPK1NPC1RAB9AMEN1KMT2A | |
| SCHEMBL14620227 | 0.71 | CYP1A2 (0.61) | KDM4EMAPK1RAB9AMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7157205-B2 | Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |