Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7533236 | 0.83 | KDM4E (0.51) | KDM4EALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL14620223 | 0.82 | ALDH1A1 (0.44) | ALDH1A1MEN1KMT2ATSHRCYP1A2 | |
| SCHEMBL7531474 | 0.82 | L3MBTL1 (0.50) | KDM4EALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL27370760 | 0.81 | ALDH1A1 (0.66) | KDM4EALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL9013659 | 0.81 | KDM4E (0.49) | KDM4EALDH1A1TSHRCYP1A2L3MBTL1 | |
| SCHEMBL14620227 | 0.80 | CYP1A2 (0.61) | KDM4EALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL7528390 | 0.80 | VDR (0.49) | KDM4EALDH1A1TSHRCYP1A2L3MBTL1 | |
| SCHEMBL14620596 | 0.79 | KDM4E (0.63) | KDM4EMEN1KMT2AL3MBTL1LMNA | |
| SCHEMBL14588659 | 0.78 | ALDH1A1 (0.63) | KDM4EALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL14620106 | 0.78 | KMT2A (0.51) | KDM4EALDH1A1MEN1KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7157205-B2 | Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |