Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PRCP | P42785 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.31 |
| ▸ | CTSL | P07711 | 2/20 | 0.31 |
| ▸ | CTSB | P07858 | 2/20 | 0.31 |
| ▸ | CTSK | P43235 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20484020 | 0.98 | CYP2C19 (0.34) | MEN1KMT2ATSHRCYP4F2CYP4A11 | |
| SCHEMBL6278444 | 0.98 | CYP2C19 (0.34) | MEN1KMT2ATSHRCYP4F2CYP4A11 | |
| SCHEMBL28503851 | 0.95 | SMN1; SMN2 (0.31) | MEN1KMT2ATSHRCTSLCTSB | |
| SCHEMBL28503847 | 0.91 | — | — | |
| SCHEMBL14991061 | 0.84 | MEN1 (0.32) | MEN1KMT2ATSHRALDH1A1 | |
| SCHEMBL20483832 | 0.83 | — | — | |
| SCHEMBL20484018 | 0.82 | CYP2C19 (0.31) | MEN1KMT2ATSHRCYP2C19CTSL | |
| SCHEMBL14655833 | 0.82 | MEN1 (0.31) | MEN1KMT2ATSHR | |
| SCHEMBL14990797 | 0.82 | CYP2C19 (0.31) | MEN1KMT2ATSHRCYP2C19CTSL | |
| SCHEMBL143845 | 0.82 | ALDH1A1 (0.33) | MEN1KMT2ATSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152693-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152693-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |
| CN-115023455-A | Foamed polyurethane composition | 美国主席团有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-106610566-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-106444288-B | Chemically amplified positive resist composition and pattern forming method | 信越化学工业株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-3163374-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-02 | — | — | EP | disclosed |
| EP-3128368-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-01-24 | — | — | EP | disclosed |
| EP-3163374-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-05-03 | — | — | EP | disclosed |
| US-20170115567-A1 | Chemically Amplified Positive Resist Composition and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| EP-3128368-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-02-08 | — | — | EP | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20130026044-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| EP-2551722-A1 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-30 | — | — | EP | disclosed |