Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2680378 | 1.00 | CYP1A2 (0.41) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL2064950 | 0.98 | CYP1A2 (0.38) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methyl Alcohol SCHEMBL30448702 | 0.88 | ALDH1A1 (0.44) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL9234902 | 0.88 | ALDH1A1 (0.47) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL31436724 | 0.85 | ALDH1A1 (0.41) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL15456713 | 0.82 | ALDH1A1 (0.42) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL3195737 | 0.79 | ALDH1A1 (0.63) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL2920990 | 0.77 | CYP1A2 (0.59) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL10165469 | 0.77 | CYP1A2 (0.37) | CYP1A2ALDH1A1USP2LMNATSHR | |
| SCHEMBL782180 | 0.77 | EPHX1 (0.31) | TSHRTET2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310683-B2 | Monomer, polymer, positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-8841061-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8808966-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8574817-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130288180-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130084529-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084528-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084527-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130029269-A1 | POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |