Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2680378 | 0.98 | CYP1A2 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL14658792 | 0.98 | CYP1A2 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| Methyl Alcohol SCHEMBL30448702 | 0.86 | ALDH1A1 (0.44) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL9234902 | 0.85 | ALDH1A1 (0.47) | CYP1A2USP2ALDH1A1LMNATSHR | |
| Methacrylic Acid SCHEMBL31436724 | 0.82 | ALDH1A1 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL15456713 | 0.80 | ALDH1A1 (0.42) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL2920990 | 0.79 | CYP1A2 (0.59) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL782180 | 0.78 | EPHX1 (0.31) | TSHRTET2 | |
| SCHEMBL3195737 | 0.77 | ALDH1A1 (0.63) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL171911 | 0.76 | CYP1A2 (0.34) | CYP1A2USP2ALDH1A1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10626287-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device | FUJIFILM CORPORATION (JP) | 2020-04-21 | — | — | US | disclosed |
| US-10246605-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-10191375-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device | FUJIFILM CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20180002561-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, IMPRINT FORMING KIT, LAMINATE, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2018-01-04 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9678425-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9678426-B2 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-06-13 | — | — | US | disclosed |
| US-20170158905-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, IMPRINT FORMING KIT, AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20170146907-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, IMPRINT FORMING KIT AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170088743-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-03-30 | — | — | US | disclosed |
| US-20120115086-A1 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-8148053-B2 | DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20110245395-A1 | Top Coat Composition | CENTRAL GLASS COMPANY, LIMITED | 2011-10-06 | — | — | US | disclosed |
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | Central Glass Company , Limited (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110213175-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-09-01 | — | — | US | disclosed |
| US-20080248418-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-10-09 | — | — | US | disclosed |
| US-20080233292-A1 | Method for manufacturing substrate for microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080233309-A1 | Method for manufacturing substrate for making microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-6861197-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-01 | — | — | US | disclosed |
| US-20030008231-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | AFF1, FRG1, AFF2 | CYP1A2 2813/4885USP2 2530/4885ALDH1A1 2056/4885 |
| US-20080248418-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | NOTUM, MTHFD2, FAR1 | CYP1A2 912/4885USP2 1485/4885ALDH1A1 121/4885 |
| US-20110213175-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | NOTUM, MTHFD2, FAR1 | CYP1A2 912/4885USP2 1485/4885ALDH1A1 121/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.