SCHEMBL14667643

SCHEMBL14667643

CC(Cc1ccccc1)OCCOc1ccc(F)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 1/20 0.51
▸ CYP2D6 P10635 1/20 0.51
▸ CYP2C19 P33261 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.51
▸ SIGMAR1 Q99720 1/20 0.48
▸ PPARA Q07869 2/20 0.47
▸ PPARG P37231 1/20 0.47
▸ SLC6A4 P31645 1/20 0.45
▸ SLC6A3 Q01959 1/20 0.45
▸ LTA4H P09960 1/20 0.43
▸ NPC1 O15118 1/20 0.42
▸ RAB9A P51151 1/20 0.42
▸ FFAR1 O14842 1/20 0.42
▸ GPR34 Q9UPC5 1/20 0.41
▸ PPARD Q03181 1/20 0.41
▸ HTR7 P34969 2/20 0.41
▸ ADRA1D P25100 1/20 0.41
▸ HTR2C P28335 1/20 0.41
▸ ADRA1A P35348 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14667591 0.89 SIGMAR1 (0.58) SIGMAR1PPARAPPARGSLC6A4SLC6A3
SCHEMBL14667596 0.86 SIGMAR1 (0.53) SIGMAR1PPARAPPARGLTA4HNPC1
SCHEMBL14667595 0.80 ESRRB (0.49) SIGMAR1PPARAPPARGNPC1RAB9A
SCHEMBL8671057 0.77 CYP1A2 (0.66) CYP1A2CYP2D6CYP2C19TDP1L3MBTL1
SCHEMBL14667598 0.76 HRH3 (0.47) SIGMAR1PPARAPPARGLTA4H
SCHEMBL14671200 0.76 MAOB (0.47) L3MBTL1SIGMAR1PPARAPPARGNPC1
SCHEMBL15079872 0.76 NPC1 (0.69) CYP1A2CYP2D6CYP2C19TDP1L3MBTL1
SCHEMBL14667594 0.74 HTR7 (0.53) RAB9AHTR7
SCHEMBL9114592 0.73 CYP1A2 (0.63) CYP1A2CYP2D6CYP2C19TDP1L3MBTL1
SCHEMBL13588495 0.73 KCNA3 (0.50) TDP1SIGMAR1LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
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